75th Annual Gaseous Electronics Conference
Volume 67, Number 9
Monday–Friday, October 3–7, 2022;
Sendai International Center, Sendai, Japan
The session times in this program are intended for Japan Standard Time zone in Tokyo, Japan (GMT+9)
Session Index
Session FR1: Magnetron Plasmas
Chair: Yevgeny Raitses, PPPL
Room: Sendai International Center Shirakashi 1
Thursday, October 6, 2022
8:00AM - 8:30AM
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FR1.00001: Electron power absorption in magnetron sputtering discharges
Invited Speaker:
Bocong Zheng
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Thursday, October 6, 2022
8:30AM - 8:45AM
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FR1.00002: Modeling of high power impulse magnetron sputtering (HiPIMS) discharges with graphite target
Henrik Eliasson, Martin Rudolph, Kateryna Barynova, Nils Brenning, Michael A Raadu, Hamidreza Hajihoseini, Tiberiu M Minea, Daniel Lundin, Jon T Gudmundsson
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Thursday, October 6, 2022
8:45AM - 9:00AM
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FR1.00003: Study of ac magnetically enhanced capacitively coupled plasma argon discharges using particle-in-cell simulations
Kaviya Aranganadin, Guoning Wang, Hua-Yi Hsu, John P. Verboncoeur, Ming-Chieh Lin
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Thursday, October 6, 2022
9:00AM - 9:15AM
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FR1.00004: Electron energization via ExB drift generation in rf magnetrons operated at a low pressure
Denis Eremin, Birk Berger, Jens Kallähn, Kevin Köhn, Dennis Krueger, Liang Xu, Peter Awakowicz, Julian Schulze, Ralf Peter Brinkmann
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Thursday, October 6, 2022
9:15AM - 9:30AM
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FR1.00005: Formation and sustainment of spokes in planar dc magnetrons
Denis Eremin, Liang Xu, Jens Kallaehn, Kevin Koehn, Dennis Krueger, Ralf Peter Brinkmann
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Session FR2: Low Pressure Plasmas
Chair: Kazunori Takahashi, Tohoku University
Room: Sendai International Center Shirakashi 1
Thursday, October 6, 2022
10:00AM - 10:30AM
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FR2.00001: Instabilities and turbulent processes in low-temperature magnetized plasmas
Invited Speaker:
Kentaro Hara
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Thursday, October 6, 2022
10:30AM - 10:45AM
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FR2.00002: Initial Characterization of the EEDF of an ECR-based Plasma Cathode Operating on Molecular Gases
Anil Bansal, John E Foster, Michael S McDonald
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Thursday, October 6, 2022
10:45AM - 11:00AM
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FR2.00003: Analyses of enhancement of energy deposition to electrons by partial resonance in an inductively coupled plasma under confronting divergent magnetic fields
Ryota Okazaki, Hirotake Sugawara
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Thursday, October 6, 2022
11:00AM - 11:15AM
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FR2.00004: Diagnosing hydrogen plasma in a high power helicon device
Campbell Strachan
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Thursday, October 6, 2022
11:15AM - 11:30AM
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FR2.00005: Surrogate models of capacitively-coupled plasmas by machine learning
Kazumasa Ikuse, Masakazu Ichikawa, Kuan-Lin Chen, Jong-Shinn Wu, Fatima Jenina T Arellano, Zoltan Donko, Satoshi Hamaguchi
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Thursday, October 6, 2022
11:30AM - 11:45AM
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FR2.00006: Study of the collisional effects and increasing perpendicular magnetic field on the expansion of a laser produced plasma.
Zachary K White, Gabe Xu
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Thursday, October 6, 2022
11:45AM - 12:00PM
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FR2.00007: Novel Transport Properties of Strongly Magnetized Plasmas
Scott D Baalrud, Louis Jose, Trevor Lafleur
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Session FR4: Gas Phase Plasma Chemistry
Chair: Hiroshi Akatsuka, Tokyo Institute of Technology
Room: Sendai International Center Shirakashi 1
Thursday, October 6, 2022
1:30PM - 2:00PM
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FR4.00001: Control of reactive species formation in atmospheric pressure plasmas using pulsed power deposition
Invited Speaker:
Andrew R Gibson
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Thursday, October 6, 2022
2:00PM - 2:30PM
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FR4.00002: The Promise of Data-Driven Methods for Characterization, Diagnostics and Control of Plasma Processing of Complex Surfaces
Invited Speaker:
Ali Mesbah
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Thursday, October 6, 2022
2:30PM - 2:45PM
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FR4.00003: Controlling O3 production in low-temperature He+O2 atmospheric-pressure plasmas using tailored voltage waveforms
Ben Harris, Erik Wagenaars
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Thursday, October 6, 2022
2:45PM - 3:00PM
Author not Attending
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FR4.00004: Selectivity Control in an Atmospheric Pressure Plasma Source for Point-of-Use Water Disinfection
Chelsea M Tischler, Roxanne Z-P Walker, John E Foster
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Thursday, October 6, 2022
3:00PM - 3:15PM
Author not Attending
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FR4.00005: Plasma-assisted Deflagration to Detonation Transition of Dimethyl Ether in a Microchannel
Madeline Vorenkamp, Scott Steinmetz, Timothy Chen, Andrey Starikovskiy, Christopher J Kliewer, Yiguang Ju
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Session FR5: Modeling - Plasma Processing and Chemistry II
Chair: Margherita Altin, Maastricht University
Room: Sendai International Center Shirakashi 1
Thursday, October 6, 2022
4:00PM - 4:15PM
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FR5.00001: Two and Three Dimensional Inductive Coupled Plasma Remote Source Modeling with Single and Gas mixtures with Experimental Validation
Abhra Roy, Shawming Ma, Luke Zhang, Yun Yang
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Thursday, October 6, 2022
4:15PM - 4:30PM
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FR5.00002: Kinetic Study of Effects of RF Pulsing in Dual Frequency Capacitively Coupled Plasma
Abhishek Verma, Kallol Bera, Shahid Rauf, Dmytro Sydorenko, Igor D Kaganovich, Willca Villafana
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Thursday, October 6, 2022
4:30PM - 5:00PM
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FR5.00003: Insights from Modeling Low-Pressure High-Voltage Dual-Frequency Capacitively Coupled Plasmas
Invited Speaker:
Amanda M Lietz
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Thursday, October 6, 2022
5:00PM - 5:15PM
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FR5.00004: Particle-in-Cell Techniques for Simulations of Magnetron Sputtering
Joseph G Theis, Gregory R Werner, Thomas G Jenkins, Daniel Main, John R Cary
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Thursday, October 6, 2022
5:15PM - 5:30PM
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FR5.00005: Hybrid Plasma Modeling of Low-Pressure Oxygen Plasma in Capacitively Coupled Plasma Reactors
Sathya S Ganta, Han Luo, Shahid Rauf, Kallol Bera
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Thursday, October 6, 2022
5:30PM - 5:45PM
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FR5.00006: Hybrid Plasma Simulation of RF Hollow Cathode Discharge at Moderate Pressure
Kallol Bera, Abhishek Verma, Sathya S Ganta, Shahid Rauf, Ken Collins
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Thursday, October 6, 2022
5:45PM - 6:00PM
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FR5.00007: Modelling of a Toroidal Wave Heated Plasma Source for the Remote Generation of Neutral Radicals
Scott J Doyle, Amanda M Larson, Guy Rosenzweig, Keith Koai, Mark J Kushner
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