Bulletin of the American Physical Society
75th Annual Gaseous Electronics Conference
Volume 67, Number 9
Monday–Friday, October 3–7, 2022;
Sendai International Center, Sendai, Japan
The session times in this program are intended for Japan Standard Time zone in Tokyo, Japan (GMT+9)
Session FR1: Magnetron Plasmas
8:00 AM–9:30 AM,
Thursday, October 6, 2022
Sendai International Center
Room: Shirakashi 1
Chair: Yevgeny Raitses, PPPL
Abstract: FR1.00004 : Electron energization via ExB drift generation in rf magnetrons operated at a low pressure*
9:00 AM–9:15 AM
Presenter:
Denis Eremin
(Ruhr Univ Bochum)
Authors:
Denis Eremin
(Ruhr Univ Bochum)
Birk Berger
(Ruhr Univ Bochum)
Jens Kallähn
(Ruhr University Bochum)
Kevin Köhn
(Ruhr Univ Bochum)
Dennis Krueger
(Ruhr Univ Bochum)
Liang Xu
(Ruhr Univ Bochum)
Peter Awakowicz
(Ruhr Univ Bochum)
Julian Schulze
(Ruhr Univ Bochum)
Ralf Peter Brinkmann
(Ruhr Univ Bochum)
primarily when the target is nonconductive. To reduce interaction of the sputtered
particle fluxes with the working gas, such a technology is commonly applied at a low pressure.
It appears that it is still not completely clear how a population of highly energetic electrons
above the ionization threshold is produced under such circumstances. For instance, in contrast to
dc magnetrons, where secondary electrons accelerated in the cathode fall can significantly
contribute to the group of energetic electrons, this mechanism is of minor importance for
rf magnetrons. This work discusses a possible mechanism dominating the electron energization in
rf magnetrons based on results of simulations conducted with an implicit electrostatic energy-conserving PIC/MCC code.
It is argued that such a mechanism is caused by an essentially collisionless generation of a strong
ExB drift (aka "Hall heating"). This happens due to the fact that electrons are sufficiently
magnetized and their motion across magnetic field lines is impeded, so that they can interact
with very strong electric fields in the sheath or pre-sheath areas during time evolution of the latter.
Such a mechanism is essentially different from both the Ohmic and the sheath heating in unmagnetized CCP
discharges, therefore we propose to name the new heating mode "mu-mode" to stress its electron
magnetization origin.
*This work was funded by the German Research Foundation within the framework of theSonderforschungsbereich SFB-TR 87 and the project "Plasmabasierte Prozessführung von reaktivenSputterprozessen" (No. 417888799).
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