Bulletin of the American Physical Society
75th Annual Gaseous Electronics Conference
Volume 67, Number 9
Monday–Friday, October 3–7, 2022;
Sendai International Center, Sendai, Japan
The session times in this program are intended for Japan Standard Time zone in Tokyo, Japan (GMT+9)
Session FR4: Gas Phase Plasma Chemistry
1:30 PM–3:15 PM,
Thursday, October 6, 2022
Sendai International Center
Room: Shirakashi 1
Chair: Hiroshi Akatsuka, Tokyo Institute of Technology
Abstract: FR4.00003 : Controlling O3 production in low-temperature He+O2 atmospheric-pressure plasmas using tailored voltage waveforms*
2:30 PM–2:45 PM
Presenter:
Erik Wagenaars
(York Plasma Institute, University of York, UK)
Authors:
Ben Harris
(York Plasma Institute, University of York, UK)
Erik Wagenaars
(York Plasma Institute, University of York, UK)
When different waveforms of constant peak-to-peak voltage are applied, including extra harmonics in the driving waveform considerably enhances O3 production until an upper limit of N=4. At this limit, an increase in power deposition likely increases the background gas temperature and drives the decomposition of O3 into O2. When a constant power is supplied to the plasma rather than a constant voltage, O3 production can also be enhanced but the effect is not as strong as with constant voltage. The increased O3 production at constant power is linked to a power deposition that is more localised in time, due to increased potential gradients in the plasma.
*We acknowledge UK EPSRC support (EP/S026584/1, EP/S025790/1)
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