Bulletin of the American Physical Society
76th Annual Gaseous Electronics Conference
Volume 68, Number 9
Monday–Friday, October 9–13, 2023; Michigan League, Ann Arbor, Michigan
Session Index
Session GW1: Plasma Diagnostics and Etching
Chair: Jean-Paul Booth, LPP-CNRSRoom: Michigan League, Henderson
Wednesday, October 11, 2023 8:00AM - 8:30AM |
GW1.00001: Probing low temperature plasmas with structured light beams and derivative spectroscopy Invited Speaker: Ivan Romadanov | |
Wednesday, October 11, 2023 8:30AM - 8:45AM |
GW1.00002: Plasma-based pseudo-wet mechanism for cryogenic SiO2 etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis Shih-Nan Hsiao, Makoto Sekine, Takayoshi Tsutsumi, Kenji Ishikawa, Manabu Iwata, Maju Tomura, Yuki Iijima, Taku Gohira, Keiichi Matsushima, Yoshinobu Ohya, Masaru Hori | |
Wednesday, October 11, 2023 8:45AM - 9:00AM |
GW1.00003: Automatic Optimization of Reaction Mechanisms in Simulations of High Aspect Ratio Plasma Etching Florian Krueger, Du Zhang, Pingshan Luan, Minsoek Oh, Minjoon Park, Andrew Metz, Mark Kushner | |
Wednesday, October 11, 2023 9:00AM - 9:30AM |
GW1.00004: State-of-the-art plasma etch process and technologies for high aspect ratio pattern Invited Speaker: Maju Tomura |
Session GW4: Green Plasma Technologies II
Chair: Thomas Mussenbrock, Bochum UniversityRoom: Michigan League, Henderson
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