Bulletin of the American Physical Society
76th Annual Gaseous Electronics Conference
Volume 68, Number 9
Monday–Friday, October 9–13, 2023; Michigan League, Ann Arbor, Michigan
Session GW1: Plasma Diagnostics and Etching
8:00 AM–9:30 AM,
Wednesday, October 11, 2023
Room: Michigan League, Henderson
Chair: Jean-Paul Booth, LPP-CNRS
Abstract: GW1.00002 : Plasma-based pseudo-wet mechanism for cryogenic SiO2 etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis
8:30 AM–8:45 AM
Presenter:
Shih-Nan Hsiao
(Nagoya university)
Authors:
Shih-Nan Hsiao
(Nagoya university)
Makoto Sekine
(Nagoya University)
Takayoshi Tsutsumi
(Nagoya University)
Kenji Ishikawa
(Nagoya University, Japan)
Manabu Iwata
(Tokyo Electron Ltd.)
Maju Tomura
(Tokyo Electron Ltd.)
Yuki Iijima
(Tokyo Electron Ltd.)
Taku Gohira
(Tokyo Electron Ltd.)
Keiichi Matsushima
(Tokyo Electron Ltd.)
Yoshinobu Ohya
(Tokyo Electron Ltd.)
Masaru Hori
(Nagoya University)
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