Friday, October 17, 2008
1:30PM - 1:45PM
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XF1.00001: Evaluation of Plasma Ashing Damages on Porous SiOCH Films by Measurement of H and N Radical Densities
Hiroshi Yamamoto
, Keigo Takeda
, Makoto Sekine
, Masaru Hori
Preview Abstract |
Friday, October 17, 2008
1:45PM - 2:00PM
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XF1.00002: Threshold energy for plasma etching of high-$k$ dielectric HfO$_{2}$ films in BCl$_{3}$-containing plasmas
Yoshinori Ueda
, Keisuke Nakamura
, Hiroaki Kiyokami
, Hiroaki Ohta
, Koji Eriguchi
, Kouichi Ono
Preview Abstract |
Friday, October 17, 2008
2:00PM - 2:15PM
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XF1.00003: Etch Challenges Brought by the Metal Hardmask Approach for Advanced Contact Patterning with Fluorocarbon-based Plasma
Jean-Francois de Marneffe
, Danny Goossens
, Denis Shamiryan
, Herbert Struyf
, Werner Boullart
Preview Abstract |
Friday, October 17, 2008
2:15PM - 2:30PM
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XF1.00004: Porous Low-k Material Etch For 32 nm and Beyond
Yifeng Zhou
, Qingjun Zhou
, Ryan Patz
, Hairong Tang
, Jeremiah Pender
, Michael Armacost
, Catherine Labelle
, David Horak
Preview Abstract |
Friday, October 17, 2008
2:30PM - 2:45PM
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XF1.00005: ABSTRACT WITHDRAWN
Preview Abstract |
Friday, October 17, 2008
2:45PM - 3:00PM
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XF1.00006: Control Capabilities of Low-Inductance-Antenna-Driven RF Plasmas for Low-Damage Processing of Polymers
Yuichi Setsuhara
, Kosuke Takenaka
, Ken Cho
, Akinori Ebe
, Masaharu Shiratani
, Makoto Sekine
, Masaru Hori
Preview Abstract |
Friday, October 17, 2008
3:00PM - 3:15PM
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XF1.00007: Impact of Wafer Bias in an Inductively Coupled Plasma Reactor
Prashanth Kothnur
, Ananth Bhoj
, Xiaohui Yuan
, Laxminarayan Raja
Preview Abstract |
Friday, October 17, 2008
3:15PM - 3:30PM
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XF1.00008: The effect of plasmas on the equilibrium shapes of semi-conducting nanocrystals
Eugene Tam
, Kostya Ostrikov
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Friday, October 17, 2008
1:30PM - 2:00PM
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XF2.00001: Nonlinear Effects on Heating in Capacitive Discharges
Invited Speaker:
Thomas Mussenbrock
Preview Abstract |
Friday, October 17, 2008
2:00PM - 2:15PM
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XF2.00002: The RF Sheath, Nonlinearity and Stochastic heating: An extended analytical approach
Michael Klick
Preview Abstract |
Friday, October 17, 2008
2:15PM - 2:30PM
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XF2.00003: Effects of Magnetic Field on Very High Frequency Capacitively Coupled Plasma
Kallol Bera
, Shahid Rauf
, Ken Collins
Preview Abstract |
Friday, October 17, 2008
2:30PM - 2:45PM
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XF2.00004: Resonance heating of dual frequency capacitive discharges
Dennis Ziegler
, Thomas Mussenbrock
, Ralf Peter Brinkmann
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Friday, October 17, 2008
2:45PM - 3:00PM
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XF2.00005: Electrode Impedance Effect on Electron Density in a CCP Reactor
Yohei Yamazawa
Preview Abstract |
Friday, October 17, 2008
3:00PM - 3:15PM
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XF2.00006: Characteristics of Pulsed Capacitively Coupled Plasma Sources for Plasma Etching
Ankur Agarwal
, Phillip Stout
, Shahid Rauf
, Ken Collins
Preview Abstract |
Friday, October 17, 2008
3:15PM - 3:30PM
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XF2.00007: A Parallelized 3D Particle-In-Cell Method With Magnetostatic Field Solver And Its Applications
Kuo-Hsien Hsu
, Yen-Sen Chen
, Men-Zan Bill Wu
, Jong-Shinn Wu
Preview Abstract |