Bulletin of the American Physical Society
61st Annual Gaseous Electronics Conference
Volume 53, Number 10
Monday–Friday, October 13–17, 2008; Dallas, Texas
Session XF1: Material Processing II
1:30 PM–3:30 PM,
Friday, October 17, 2008
Room: Salon E
Chair: S.G. Walton, Naval Research Laboratory
Abstract ID: BAPS.2008.GEC.XF1.3
Abstract: XF1.00003 : Etch Challenges Brought by the Metal Hardmask Approach for Advanced Contact Patterning with Fluorocarbon-based Plasma
2:00 PM–2:15 PM
Preview Abstract Abstract
Authors:
Jean-Francois de Marneffe
(IMEC v.z.w. 75 Kapeldreef B-3001 Leuven, Belgium)
Danny Goossens
(IMEC v.z.w. 75 Kapeldreef B-3001 Leuven, Belgium)
Denis Shamiryan
(IMEC v.z.w. 75 Kapeldreef B-3001 Leuven, Belgium)
Herbert Struyf
(IMEC v.z.w. 75 Kapeldreef B-3001 Leuven, Belgium)
Werner Boullart
(IMEC v.z.w. 75 Kapeldreef B-3001 Leuven, Belgium)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2008.GEC.XF1.3
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