Bulletin of the American Physical Society
APS March Meeting 2021
Volume 66, Number 1
Monday–Friday, March 15–19, 2021; Virtual; Time Zone: Central Daylight Time, USA
Session F56: Devices from 2D Materials: Function, Fabrication and Characterization - IIFocus Session Live
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Sponsoring Units: DMP Chair: Mario Lanza |
Tuesday, March 16, 2021 11:30AM - 11:42AM Live |
F56.00001: Contact Scaling for 2D FETs Using Asymmetrical Contact Measurements Zhihui Cheng, Huairuo Zhang, Hattan Abuzaid, Jonathan Beckman, Yifei Yu, Shreya Singh, Albert V. Davydov, Mathieu Luisier, Curt Richter, Aaron D. Franklin Atomically thin two-dimensional (2D) crystals are promising channel materials for extremely scaled field-effect transistors (FETs) for the 2030 era [1]. In the quest of ultra-scaled transistors, both channel length (distance from source to drain contacts) and contact length (distance that the contacts overlap the 2D channel) must be scaled. However, contacting 2D materials at scaled contact lengths (Lc < 30 nm) has rarely been pursued or studied in-depth. In this work, we experimentally scaled contact length for Ni-contacted MoS2 FETs and use asymmetrical contact measurements (ACM) as a new approach for characterizing the devices. We found that, contrary to most previous reports, top contacts can be scaled down to ~30 nm without noticeable degradation in contact resistance. Surprisingly, we also observed significant self-heating in scaled contacts in the saturation regime. While the first observation is promising for extremely scaled FET technologies, the second illustrates that current crowding in metal-2D contacts is a challenge toward the development for future scaled devices. |
Tuesday, March 16, 2021 11:42AM - 11:54AM Live |
F56.00002: High-Performance WSe2 Field-Effect Transistors with Accumulation-Type Ohmic Contacts Kraig J Andrews, Upendra Rijal, Arthur Bowman, Hsun jen Chuang, Jiaqiang Yan, David George Mandrus, Zhixian Zhou We report the creation of accumulation-type ohmic contacts between an intrinsic 2D semiconductor and a degenerately doped 2D semiconductor acting as a 2D metal. Our back-gated WSe2 field-effect transistors (FETs) with bottom-contacts exhibit excellent device performance, including linear output characteristics, a high on/off ratio of 108, and two-terminal extrinsic field-effect mobility approaching the phonon-limited intrinsic mobility. As the temperature decreases, the drain-source current increases while the output characteristics remain linear. Because the back-gate does not electrostatically modulate the intrinsic WSe2 in the drain/source contact regions due to screening by the bottom-contacts, the observed excellent device performance and ohmic behavior can be attributed to the formation of accumulation-type ohmic contacts that are free of a Schottky barrier. The accumulation-type ohmic contacts are further confirmed by dual-gated measurements, where a positive top-gate voltage is applied to deliberately deplete the holes in WSe2 at the drain/source contacts. |
Tuesday, March 16, 2021 11:54AM - 12:30PM Live |
F56.00003: Enabling transistor scaling with 2D materials Invited Speaker: Iuliana Radu Transistor scaling has been the main driver for a giant boom in productivity and for the development of society and technology as we know them. However, silicon transistor scaling is becoming increasingly difficult and potentially approaches its physical limits. 2D materials could enable this scaling beyond what could be achieved with Si. We will discuss here how a roadmap for 2D materials adoption in transistor scaling can be built and potential technology nodes where these materials can be adopted. Challenges for the technical implementation abound, and we will outline our work to solve them. We will also cover design-technology co-optimization aspects and explain how model calibration can speed-up technological adoption. In this context, we will outline stacked transistor architectures where 2D materials could serve as channel and detail our work for integrated these in flows on 300mm wafers in imec’s CMOS fab. |
Tuesday, March 16, 2021 12:30PM - 12:42PM Live |
F56.00004: One-Dimensional Edge Contact to Encapsulated MoS2 with a Superconductor Andrew Seredinski, Ethan Arnault, Viviane Z. Costa, Lingfei Zhao, Trevyn Larson, Kenji Watanabe, Takashi Taniguchi, Francois Amet, Akm Newaz, Gleb Finkelstein Establishing ohmic contact to van der Waals semiconductors such as MoS2 is crucial to unlocking their full potential in next-generation electronic devices. Encapsulation of few layer MoS2 with hBN preserves the material’s electronic properties but makes electrical contacts more challenging. Progress toward high quality edge contact to encapsulated MoS2 has been recently reported. We evaluate an edge contact methodology using sputtered MoRe, a Type II superconductor with a relatively high critical field and temperature. While the resulting contact is not ohmic, this work has ramifications for future contact recipes and may hold promise for application to hybrid structures. |
Tuesday, March 16, 2021 12:42PM - 12:54PM Live |
F56.00005: Demonstration of TiO2-monolayer TMDC interface Kai Hao, Robert Shreiner, Amy Butcher, Alexander A High We demonstrate the integration of TiO2 nanophotonics and monolayer transition metal dichalcogenides (TMDCs) by fabricating a TiO2 waveguide on top of hBN-encapsulated monolayer tungsten diselenide (WSe2). The evanescent field of the propagating modes in the waveguide carries transverse optical spins, which can selectively couple to the WSe2 excitonic states in the two opposite valleys. The coupling allows us to generate a flux of spatially separated valley-polarized excitonic states when we pump from the waveguide. This study sheds light on future valleytronic applications of nanophotonic-TMDC interfaces. |
Tuesday, March 16, 2021 12:54PM - 1:06PM Live |
F56.00006: High-quality electrical contacts to van der Waals superconductors Abhinandan Antony, Martin V Gustafsson, Anjaly Rajendran, Guilhem Ribeill, Avishai Benyamini, Thomas A Ohki, Kin Chung Fong, James Hone Layered Van der Waals (VdW) superconductors are a great promise for high frequency devices such as qubits, due to their highly crystalline nature and potentially defect free interfaces. A major obstacle toward this goal is the requirement for extremely high-performance contacts, which is challenging due to the air-sensitivity of common VdW superconductors such as NbSe2 .We have developed and tested a reliable lift-off recipe for making superconducting contact between multi-layer crystals of NbSe2 and aluminum films, using argon ion milling to strip away degraded layers of NbSe2 before in situ aluminum deposition. Because performance at the level required for quantum applications cannot be tested by low-frequency techniques, we have fabricated microwave resonators with embedded NbSe2 flakes and characterized these at cryogenic temperature. We find that the contacts achieved have low enough losses to be used in high-quality quantum devices. |
Tuesday, March 16, 2021 1:06PM - 1:42PM Live |
F56.00007: Non-volatile switches based on 2D materials for 5G/6G applications. Invited Speaker: Emiliano Pallecchi Recently, non-volatile switching has been observed in various monolayer and multilayer 2D films[1]. In this contribution, we will show that wafer-scale 2D-materials such as MoS2 and hBN can be used for low-power non-volatile switches with applications in communications systems for 5G and 6G. The 2D-based RF switch is a metal-insulator-metal vertical structure made of two electrodes separated by a thin 2D film. It is promising for high-frequency operation because of the favorable scaling compared to other emerging technologies[2]. |
Tuesday, March 16, 2021 1:42PM - 1:54PM Live |
F56.00008: Fabrication of quantum Hall interferometers in high quality graphene van der Waals heterostructures using local oxidation lithography Liam Cohen, Noah Samuelson, Kenji Watanabe, Takashi Taniguchi, Andrea Young Fabry-Pérot interferometry of fractional quantum Hall edge states has long been known to provide an effective experimental probe of non-abelian statistics, for instance in even denominator fractional quantum Hall states. Recent work in high quality bilayer graphene van der Waals heterostructures has revealed even-denominator states with large energy gaps, bringing such experiments within reach. However, fabrication of the requisite gate geometries in a van der Waals heterostructure is challenging due to the absence of a band gap and the disorder typically introduced by standard additive as well as subtractive nanofabrication processes. In this talk, we will present progress towards improved gate-defined Fabry-Pérot interferometers using AFM oxidation lithography. We show that sub-100 nm features can be patterned in graphite flakes, and these patterns transferred into arbitrary gate layers within a van der Waals heterostructure. Besides applications in quantum Hall effects, our results suggest a versatile new architecture for local electrostatic control of ultra-high mobility two dimensional electron systems. |
Tuesday, March 16, 2021 1:54PM - 2:06PM Live |
F56.00009: A current amplifier operating in the ballistic and hydrodynamic transport regimes Gitansh Kataria, Mani Chandra, Adbhut Gupta, Jean J. Heremans The momentum-relaxing length scale (due to electron-phonon, electron-defect scattering) in two-dimensional carrier systems can be as large as microns, leading to a breakdown of diffusive transport in micron-scale devices. Depending on the strength of momentum-conserving electron-electron scattering, transport in the device can either be ballistic or hydrodynamic. The ballistic regime is characterized by electrons scattering predominantly against the device boundaries, whereas the hydrodynamic regime sets in when electron-electron scattering is sufficiently strong. Both regimes have distinct nonlocal current-voltage relationships, which have been used in several experiments (e.g., in graphene, GaAs/AlGaAs) to detect the departure from diffusive transport. We now exploit the nonlocality inherent in both regimes to design a current amplifier. The amplification is determined by the device geometry, and scales linearly with the appropriate device-scale. We showcase the striking non-diffusive current flow in the amplifier. The operational principle, based on nonlocality, is distinct from previous amplification methods based on nonlinear current-voltage relations (such as the Venturi effect). |
Tuesday, March 16, 2021 2:06PM - 2:18PM On Demand |
F56.00010: Driven dipolariton transistors using van der Waals TMDC with channel guides Patrick Serafin, German Kolmakov, Tim Byrnes Using a computational approach based on the driven diffusion equation for a dipolariton wave packet, we simulate the diffusive dynamics of dipolaritons in a patterned optical microcavity embedded with a transition metal dichalcogenide (TMDC) heterogeneous bilayer. By considering exciton-dipolaritons, which are a three way superposition of direct excitons, indirect excitons and cavity photons; we are able to drive the dipolaritons in our system by the use of an electric voltage and investigate their diffusive properties. More precisely, we study the propagation of dipolaritons present in a MoSe2-WS2 heterostructure, where the dipolariton propagation is guided by Y-shaped and Ψ-shaped channel guides. We also consider the propagation of dipolaritons in the presence of a buffer in the Ψ-shaped channel branches and study the resulting changes in efficiency. By our considerations of geometrically novel dipolariton channel guides, we are able to replicate the dipolariton redistribution efficiencies of previously proposed polaritronic applications and propose novel designs for optical transistors at room temperature. |
Tuesday, March 16, 2021 2:18PM - 2:30PM Not Participating |
F56.00011: Electrical Transport and Low-Frequency Noise studies in Edge-contacted Hexagonal Boron Nitride and Graphene Heterostructure Field-Effect Transistors Aroop Behera, Charles Harris, Douglas V Pete, Collin J Delker, P E Vullum, Marta Benthem Muñiz, Ozhan Koybasi, Takashi Taniguchi, Kenji Watanabe, Branson D Belle, Suprem R Das Two-dimensional heterostructure field-effect transistors (2D-HFETs) with one-dimensional electrical contacts to two-dimensional channels have recently shown improved device performance. While a number of low-frequency noise studies exist on bare graphene devices supported on silicon dioxide gate insulators with surface contacts, such studies in heterostructure devices comprised of epitaxial graphene on hexagonal boron nitride (hBN) with channel side contacts are extremely limited. In this talk, we present a systematic, temperature-dependent study of electrical transport and low-frequency noise in edge-contacted high mobility HFET with a single atomic layer graphene channel encapsulated by hexagonal boron nitride and demonstrate ultra-low noise with Hooge parameter ~ 0.00001. We combine measurements and modeling based on underlying microscopic scattering mechanisms caused by charge carriers and phonons and finally correlate the high-performance, temperature-dependent transport of the device with its noise characteristics. Our study provides a pathway towards engineering low noise graphene-based high-performance 2D-FETs with one-dimensional edge contacts for applications such as digital electronics and chemical/biological sensing. |
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