76th Annual Gaseous Electronics Conference
Volume 68, Number 9
Monday–Friday, October 9–13, 2023;
Michigan League, Ann Arbor, Michigan
Session Index
Session FT1: Plasma Etching I
Chair: Shahid Rauf, Applied Materials, Inc.
Room: Michigan League, Koessler
Tuesday, October 10, 2023
8:00AM - 8:15AM
|
|
FT1.00001: Dynamics of Plasma Atomic Layer Etching: Molecular Dynamics Simulations and Optical Emission Spectroscopy
David B Graves, Joseph R Vella, Quinzen Hao, Vincent Donnelly
|
Tuesday, October 10, 2023
8:15AM - 8:30AM
|
|
FT1.00002: Studies on the discharge characteristics and atomic layer etching of high aspect ratio patterned-wafer in radio frequency biased inductively coupled plasma with Ar/C4F6 gas mixture
Min young Yoon, Hee Jung Yeom, Chegal Won, Yong Jai Cho, Deuk-Chul Kwon, Jong-Ryul Jeong, Jung Hyung Kim, Hyo-Chang Lee
|
Tuesday, October 10, 2023
8:30AM - 9:00AM
|
|
FT1.00003: Peculiarities of Ion and Neutral Transport in Plasma Etch Applications
Invited Speaker:
Sergey Voronin
|
Tuesday, October 10, 2023
9:00AM - 9:15AM
|
|
FT1.00004: Atomic Layer Etching of Silicon in HBr-Containing Plasmas
Vincent Donnelly, Qinzhen Hao, Pilbum Kim, Song-Yung Kang, Sang Ki Nam
|
Tuesday, October 10, 2023
9:15AM - 9:30AM
|
|
FT1.00005: OES-based Monitoring Method of Non-maxwellian EEDF and Radical Density for Etch Process Control in Ar/SF6/O2 VHF-CCP
Ji-Won Kwon, Jihoon Park, Ingyu Lee, Gon-Ho Kim
|
Session FT2: Atmospheric Pressure Plasmas II
Chair: Yusuke Nakagawa, Tokyo Metropolitan Univ
Room: Michigan League, Koessler
Tuesday, October 10, 2023
10:00AM - 10:15AM
|
|
FT2.00001: A Dielectric Resonator-Based Microwave Plasma Jet
Muhammad Rizwan Akram, Abbas Semnani
|
Tuesday, October 10, 2023
10:15AM - 10:30AM
|
|
FT2.00002: GEC Student Excellence Award Finalist Presentation - Spatio-temporal distribution of neutral radical species in an atmospheric pressure He/O2 radio-frequency plasma jet based on a spatially 2D hybrid simulation
Máté Vass, David A. Schulenberg, Zoltan Donko, Ihor Korolov, Peter Hartmann, Julian Schulze, Thomas Mussenbrock
|
Tuesday, October 10, 2023
10:30AM - 10:45AM
|
|
FT2.00003: Modeling and simulation of transport processes in capacitively coupled radio frequency driven at- mospheric pressure plasma jets
Lukas L Vogelhuber, Katharina Noesges, Maximilian Klich, Thomas Mussenbrock
|
Tuesday, October 10, 2023
10:45AM - 11:00AM
|
|
FT2.00004: Atmospheric Pressure Plasma Treatment of Surfaces with Obstacles: Controlling RONS and Photon Fluxes
Kseniia Konina, Jordyn Polito, Joshua Morsell, Steven Shannon, Mark Kushner
|
Tuesday, October 10, 2023
11:00AM - 11:30AM
|
|
FT2.00005: Cold atmospheric plasmas in rare gas jets: from metastables species to biomedical and material applications
Invited Speaker:
Joao Santos Sousa
|
Tuesday, October 10, 2023
11:30AM - 11:45AM
|
|
FT2.00006: An Efficient Atmospheric Pressure Resonant Microwave Plasma Line
Kushagra Singhal, Abbas Semnani
|
Session FT3: Plasma Deposition & Damage
Chair: Kallol Bera, Applied Materials
Room: Michigan League, Koessler
Tuesday, October 10, 2023
1:30PM - 2:00PM
|
|
FT3.00001: In-situ Diagnostics for Plasma Enhanced ALD and CVD
Invited Speaker:
Jianping Zhao
|
Tuesday, October 10, 2023
2:00PM - 2:15PM
|
|
FT3.00002: Development of Yttrium Oxide Film Deposition Method using Low-temperature Microwave Excited Atmospheric Pressure Plasma Jet
Bat-Orgil Erdenezaya, Hirochika Uratani, Ruka Yazawa, Md. Shahiduzzaman, Tetsuya Taima, Yusuke Nakano, Yasunori Tanaka, Tatsuo Ishijima
|
Tuesday, October 10, 2023
2:15PM - 2:30PM
|
|
FT3.00003: EUV-induced plasma: PIC modelling of a transient plasma fluxes
Luuk Heijmans, Dmitry Astakhov, Efe Kemaneci, Andrei M Yakunin, Mark van de Kerkhof
|
Tuesday, October 10, 2023
2:30PM - 3:00PM
|
|
FT3.00004: Understanding and controlling the role of ions during plasma-enhanced ALD and ALE
Invited Speaker:
Erwin Kessels
|
Tuesday, October 10, 2023
3:00PM - 3:15PM
|
|
FT3.00005: Evaluation of Interaction Between Substrate and Nanoparticles Deposited by Plasma Chemical Vapor Deposition
Kazunori Koga, Shinjiro Ono, Manato Eri, Takamasa Okumura, Kunihiro Kamataki, Naoto Yamashita, Naho Itagaki, Masaharu Shiratani
|
Tuesday, October 10, 2023
3:15PM - 3:30PM
|
|
FT3.00006: A Study on the Hydrogen Plasma induced material damage for EUV lithography Components and Material evaluation
Eunseok Choe, Seungwook Choi, Ansoon Kim, Kwan-Yong Kim, H. J. Yeom, Min Young Yoon, Seongwan Hong, Dong-Wook Kim, Jung Hyung Kim, Hyo-Chang Lee
|
