63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas
Volume 55, Number 7
Monday–Friday, October 4–8, 2010;
Paris, France
Session Index
Session TF4: Plasma Diagnostics III: Reactive Plasmas
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Chair: Gilles Cunge, LTM-CNRS, Grenoble, France
Room: 151
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Friday, October 8, 2010
10:30AM - 11:00AM
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TF4.00001: Increasing understanding of the plasma-surface boundary layer and surface chemistry using optical sum frequency generation diagnostic tools
Invited Speaker:
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Friday, October 8, 2010
11:00AM - 11:15AM
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TF4.00002: Non-contact monitoring of Si substrate temperature during plasma etching using optical low-coherence interferometry
Takayuki Ohta, Chishio Koshimizu, Shigeki Tuchitani, Masufumi Ito
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Friday, October 8, 2010
11:15AM - 11:30AM
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TF4.00003: Wafer-level plasma parameters measurements in a multi-frequency capacitively coupled plasma discharge
L. Dorf, S. Rauf, J. Kenney, K. Bera, N. Misra, K. Collins
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Friday, October 8, 2010
11:30AM - 11:45AM
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TF4.00004: Improvements of modulated beam mass spectrometry: application to pulsed plasma
Fran\c{c}ois Boulard, Gilles Cunge, Thierry Chevolleau, Nader Sadeghi, Olivier Joubert
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Friday, October 8, 2010
11:45AM - 12:00PM
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TF4.00005: Time-resolved electron density and OES measurements for studying the surface loss rates of H and Cl atoms in a Cl$_2$-H$_2$ ICP plasma
Garrett Curley, Lina Gatilova, Stephane Guilet, Sophie Bouchoule, Gurusharan Gogna, Nishant Sirse, Shantanu Karkari, Jean-Paul Booth
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Friday, October 8, 2010
12:00PM - 12:15PM
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TF4.00006: Time-Resolved Emission and Electrical Diagnosis of High Pressure H$_{2}$ and SiH$_{4}$/H$_{2}$ RF Discharges
Eleftherios Amanatides, Dimitrios Mataras
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Friday, October 8, 2010
12:15PM - 12:30PM
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TF4.00007: A comprehensive GD-OES and GD-MS study to elucidate the effect of trace molecular gases (O$_{2}$, H$_{2}$, and N$_{2}$) on argon-based glow discharge plasmas
S. Mushtaq, J.C. Pickering, E.B.M. Steers, P. Horvath, J.A. Whitby
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