Bulletin of the American Physical Society
63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas
Volume 55, Number 7
Monday–Friday, October 4–8, 2010; Paris, France
Session TF4: Plasma Diagnostics III: Reactive Plasmas
10:30 AM–12:30 PM,
Friday, October 8, 2010
Room: 151
Chair: Gilles Cunge, LTM-CNRS, Grenoble, France
Abstract ID: BAPS.2010.GEC.TF4.3
Abstract: TF4.00003 : Wafer-level plasma parameters measurements in a multi-frequency capacitively coupled plasma discharge
11:15 AM–11:30 AM
Preview Abstract Abstract
Authors:
L. Dorf
(Applied Materials)
S. Rauf
(Applied Materials)
J. Kenney
(Applied Materials)
K. Bera
(Applied Materials)
N. Misra
(Applied Materials)
K. Collins
(Applied Materials)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2010.GEC.TF4.3
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