Bulletin of the American Physical Society
APS March Meeting 2019
Volume 64, Number 2
Monday–Friday, March 4–8, 2019; Boston, Massachusetts
Session R33: Semiconductors and Applications I
8:00 AM–11:00 AM,
Thursday, March 7, 2019
BCEC
Room: 204B
Sponsoring
Unit:
FIAP
Chair: Mike Capano
Abstract: R33.00002 : Magnetic Field Dependent Transport Measurements on High Quality InAs Nanowires
8:12 AM–8:24 AM
Presenter:
Markus Ritter
(IBM Research - Zurich, 8803 Rüschlikon, Switzerland)
Authors:
Markus Ritter
(IBM Research - Zurich, 8803 Rüschlikon, Switzerland)
Zijin Lei
(Solid State Physics Laboratory, ETH Zürich, 8093 Zürich, Switzerland)
Benjamin Madon
(IBM Research - Almaden, San Jose, California 95120, United States)
M A Mueed
(IBM Research - Almaden, San Jose, California 95120, United States)
Aakash Pushp
(IBM Research - Almaden, San Jose, California 95120, United States)
Heinz Schmid
(IBM Research - Zurich, 8803 Rüschlikon, Switzerland)
Thomas Ihn
(Solid State Physics Laboratory, ETH Zürich, 8093 Zürich, Switzerland)
Klaus Ensslin
(Solid State Physics Laboratory, ETH Zürich, 8093 Zürich, Switzerland)
Heike Riel
(IBM Research - Zurich, 8803 Rüschlikon, Switzerland)
Fabrizio Nichele
(IBM Research - Zurich, 8803 Rüschlikon, Switzerland)
We present the low temperature characterization of InAs nanowires grown via the template assisted selective epitaxy (TASE) technique [1]. The TASE approach allows for the deterministic growth of semiconducting nanowires, networks and branched geometries on a two-dimensional silicon platform. Furthermore, structures grow encapsulated in a silicon oxide shell which preserves them from undesirable doping and surface oxidation. The high quality of TASE grown InAs nanowires was recently demonstrated by the observation of ballistic electron transport over length scales approaching one micrometer [2, 3]. In this work we additionally show quantized conductance measurements in a magnetic field and transport spectroscopy of Coulomb island devices for characterization of Lande' g-factor and spin-orbit coupling strength.
[1]: Borg, M., et al. J. Appl. Phys. 117.14 (2015): 144303.
[2]: Gooth, J., et al. Nano Lett. 17.4 (2017): 2596-2602.
[3]: Gooth, J., et al. Appl. Phys. Lett. 110.8 (2017): 083105.
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