Bulletin of the American Physical Society
APS March Meeting 2017
Volume 62, Number 4
Monday–Friday, March 13–17, 2017; New Orleans, Louisiana
Session H28: Semiconductor Processing and Devices for Application
2:30 PM–5:18 PM,
Tuesday, March 14, 2017
Room: 291
Sponsoring
Unit:
FIAP
Chair: Todd Brintlinger, Naval Research Laboratory
Abstract ID: BAPS.2017.MAR.H28.2
Abstract: H28.00002 : A MEMS Based Stencil Lithography Approach to Nanomanufacturing*
2:42 PM–2:54 PM
Preview Abstract
Abstract
Authors:
Lawrence Barrett
(Division of Material Science & Engineering, Boston University)
Thomas Stark
(Division of Material Science & Engineering, Boston University)
Jeremy Reeves
(Department of Electrical & Computer Engineering, Boston University)
Richard Lally
(Division of Material Science & Engineering, Boston University)
David Bishop
(Division of Material Science & Engineering, Boston University)
*This work is funded by the DARPA A2P Program.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2017.MAR.H28.2
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