Directed self-assembly of diblock copolymer thin films on chemically-patterned substrates for defect-free nano-patterning

We demonstrate that Polystyrene-\textit{block}-poly(methyl methacrylate) (PS-$b$-PMMA) can self-assemble in a well-aligned, long-range ordered nano-pattern over arbitrarily large areas, commensurate with chemically pre-patterned templates prepared by electron beam (EB) lithography. We also demonstrate that the self-assembly process can interpolate points in between the EB generated pattern, thus multiplying the pattern density. Moreover, we show the results of the investigation about the time-evolution of the self-assembled structure during annealing process.