Tuesday, March 17, 2009
11:15AM - 11:27AM
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J19.00001: Self-assembled surface patterns from organometallic-containing triblock terpolymers
Vivian Chuang, Caroline Ross, Jessica Gwyther, Ian Manners
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Tuesday, March 17, 2009
11:27AM - 11:39AM
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J19.00002: Improvement of Extraction Efficiency of LED with Surface Relief Nanotructure Fabricated by Self-Assembled Block Copolymer Pattern
Ryota Kitagawa, Akira Fujimoto, Koji Asakawa
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Tuesday, March 17, 2009
11:39AM - 11:51AM
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J19.00003: Self-Assembling Block Copolymer Resist Mixtures towards Lithographic Resists for Sub-10 nm Features
Curran Chandler, Vikram Daga, James Watkins
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Tuesday, March 17, 2009
11:51AM - 12:03PM
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J19.00004: Directed assembly of block copolymers on chemically nanopatterned substrates: enabling science for ultra high resolution lithography
Paul Nealey
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Tuesday, March 17, 2009
12:03PM - 12:15PM
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J19.00005: Conditions for the directed assembly of thick block copolymer films on chemically nano-patterned surfaces
Adam M. Welander, Paul F. Nealey
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Tuesday, March 17, 2009
12:15PM - 12:27PM
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J19.00006: Directed self-assembly of diblock copolymer thin films on chemically-patterned substrates for defect-free nano-patterning
Mikihito Takenaka, Yasuhiko Tada, Satoshi Akasaka, Synsuke Aburaya, Hiroshi Yoshida, Hirokazu Hasegawa, Elizabeth Dobisz, Dan Kercher
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Tuesday, March 17, 2009
12:27PM - 12:39PM
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J19.00007: Lamellar and Non-bulk like Morphologies in Thin Films of Block Copolymer on Chemical Nanopatterned Surfaces
Guoliang Liu, Francois Detcheverry, Juan J. de Pablo, Paul F. Nealey
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Tuesday, March 17, 2009
12:39PM - 12:51PM
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J19.00008: Self-confinement in Block Copolymer Thin Films Induced by Chemical Patterns Made from Electro-oxidation Nanolithorgraphy
Ji Xu, Antonio Checco, Benjamin Ocko, Soojin Park, Shiliu Wang, Thomas Russell
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Tuesday, March 17, 2009
12:51PM - 1:03PM
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J19.00009: Time-Resolved SAXS Characterization of Block Copolymer Blends on Chemically Nanopatterned Surfaces
Karl Stuen, Paul Nealey, Dillip Satapathy, Kim Nygard, Harun Solak
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Tuesday, March 17, 2009
1:03PM - 1:15PM
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J19.00010: Imaging Layer Effect on Density Multiplication in the Directed Assembly of Block Copolymer Thin Films
Huiman Kang, Eungnak Han, Padma Gopalan, Paul Nealey
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Tuesday, March 17, 2009
1:15PM - 1:27PM
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J19.00011: Molecular Transfer Printing Using Block Copolymers
Shengxiang Ji, Chi-Chun Liu, Guoliang Liu, Paul Nealey
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Tuesday, March 17, 2009
1:27PM - 1:39PM
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J19.00012: Pattern interpolation in thin films of lamellar, symmetric copolymers on nano-patterned substrates
Francois Detcheverry, Umang Nagpal, Guoliang Liu, Paul Nealey, Juan de Pablo
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Tuesday, March 17, 2009
1:39PM - 1:51PM
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J19.00013: Thin Films of Polydimethylsiloxane-Containing Block Copolymers
Maurice Wadley, Kevin Cavicchi
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Tuesday, March 17, 2009
1:51PM - 2:03PM
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J19.00014: Interfacial Bending of Lamellar Microdomains of Block Copolymers
Sang-Min Park, Meng Dong, Charles Rettner, Qiang Wang, Ho-Cheol Kim
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Tuesday, March 17, 2009
2:03PM - 2:15PM
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J19.00015: Observation of Surface Corrugation-Induced Alignment of Lamellar Microdomains in PS-b-PMMA Thin Films.
Ho-Cheol Kim, Sang-Min Park, Charles Rettner, Brian Berry, Elizabeth Dobisz
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