Bulletin of the American Physical Society
75th Annual Gaseous Electronics Conference
Volume 67, Number 9
Monday–Friday, October 3–7, 2022;
Sendai International Center, Sendai, Japan
The session times in this program are intended for Japan Standard Time zone in Tokyo, Japan (GMT+9)
Session GF3: Plasma Deposition
1:30 PM–3:30 PM,
Friday, October 7, 2022
Sendai International Center
Room: Shirakashi 2
Chair: Masaru Hori, Nagoya University
Abstract: GF3.00002 : Process analysis of cracking a-C:H/CNP/a-C:H sandwich films under stress using nanoindentation*
2:00 PM–2:15 PM
Presenter:
Shinjiro Ono
(Kyushu University)
Authors:
Shinjiro Ono
(Kyushu University)
Takamasa Okumura
(Kyushu University)
Kunihiro Kamataki
(Kyushu University)
Naoto Yamashita
(Kyushu University)
Naho Itagaki
(Kyushu University)
Kazunori Koga
(Kyushu University)
Masaharu Shiratani
(Kyushu University)
[1] S. H. Hwang et al., Jpn. J. Appl Phys. 59, 100906 (2020).
*This study was partly supported by JSPS KAKENHI Grant Numbers JP26246036, JP20H00142, and JP20J13122; JSPS Core-to-Core Program Grant Number JPJSCCA2019002.
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