Bulletin of the American Physical Society
75th Annual Gaseous Electronics Conference
Volume 67, Number 9
Monday–Friday, October 3–7, 2022;
Sendai International Center, Sendai, Japan
The session times in this program are intended for Japan Standard Time zone in Tokyo, Japan (GMT+9)
Session GF3: Plasma Deposition
1:30 PM–3:30 PM,
Friday, October 7, 2022
Sendai International Center
Room: Shirakashi 2
Chair: Masaru Hori, Nagoya University
Abstract: GF3.00001 : Deposition of silicon-based thin films with atmospheric-pressure plasmas
1:30 PM–2:00 PM
Presenter:
Matteo Gherardi
(University of Bologna)
Authors:
Matteo Gherardi
(University of Bologna)
Vittorio Colombo
(University of Bologna)
Romolo Laurita
(University of Bologna)
Giulia Laghi
(University of Bologna)
The present work will cover both applicative and fundamental aspects of the deposition process, discussing the following topics:
1) Deposition of nanostructured coatings exhibiting antibiofilm and anticlot properties, considering both the case of 2D samples for in-vitro testing and the case of 3D catheter samples for in-vivo studies;
2) Production and characterization of surface gradient coatings by single-step deposition of HMDSO;
3)Mechanisms of atmospheric pressure plasma polymerization of organosilicon precursors, investigated through laser induced fluorescence (LIF), two-photon absorption LIF (TA-LIF) and Rayleigh scattering;
4) Aerosol-plasma polymerization of organosilicon fluorinated precursors for the production of antimicrobial coatings;
5) Evaluation of the power to precursor ratio as a control parameter for aerosol-plasma polymerization at atmospheric pressure.
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