Bulletin of the American Physical Society
75th Annual Gaseous Electronics Conference
Volume 67, Number 9
Monday–Friday, October 3–7, 2022;
Sendai International Center, Sendai, Japan
The session times in this program are intended for Japan Standard Time zone in Tokyo, Japan (GMT+9)
Session ER2: Plasma Etching
10:00 AM–12:00 PM,
Thursday, October 6, 2022
Sendai International Center
Room: Hagi
Chair: Hirotaka Toyoda
Abstract: ER2.00005 : Electron-assisted photoresist etching in an inductively coupled oxygen plasma via low-energy electron beam*
11:15 AM–11:30 AM
Author not Attending
Presenter:
Jiwon Jung
(Hanyang University)
Authors:
Jiwon Jung
(Hanyang University)
Chin-Wook Chung
(Hanyang University)
*This work was supported by the Samsung Research Funding & Incubation Center of Samsung Electronics under Project Number SRFC- TA2003-02
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