Bulletin of the American Physical Society
75th Annual Gaseous Electronics Conference
Volume 67, Number 9
Monday–Friday, October 3–7, 2022;
Sendai International Center, Sendai, Japan
The session times in this program are intended for Japan Standard Time zone in Tokyo, Japan (GMT+9)
Session ER2: Plasma Etching
10:00 AM–12:00 PM,
Thursday, October 6, 2022
Sendai International Center
Room: Hagi
Chair: Hirotaka Toyoda
Abstract: ER2.00004 : Development of virtual metrology using plasma information to predict mask shape in HAR etch process*
11:00 AM–11:15 AM
Presenter:
Jaemin Song
(Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea)
Authors:
Jaemin Song
(Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea)
Namjae Bae
(Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea)
Jihoon Park
(Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea)
Taejun Park
(Department of Energy Systems Engineering, Seoul National University, Soeul, South Korea)
Ji-Won Kwon
(Department of Energy Systems Engineering, Seoul National University, Soeul, South Korea)
Sangwon Ryu
(Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea)
Ingyu Lee
(Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea)
Gon-Ho Kim
(Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea)
*This work was supported by the National Research Council of Science & Technology (NST) grant by the Korea Government (MSIT) (No.CRC-20-01-NFRI)
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