Bulletin of the American Physical Society
75th Annual Gaseous Electronics Conference
Volume 67, Number 9
Monday–Friday, October 3–7, 2022;
Sendai International Center, Sendai, Japan
The session times in this program are intended for Japan Standard Time zone in Tokyo, Japan (GMT+9)
Session ER2: Plasma Etching
10:00 AM–12:00 PM,
Thursday, October 6, 2022
Sendai International Center
Room: Hagi
Chair: Hirotaka Toyoda
Abstract: ER2.00002 : Effects of the focus ring on uniformity in capacitively coupled plasma etching reactors*
10:15 AM–10:30 AM
Author not Attending
Presenter:
Fang-Fang Ma
(Dalian University of Technology)
Authors:
Fang-Fang Ma
(Dalian University of Technology)
Quan-Zhi Zhang
(Dalian University of Technology)
Jing-Yu Sun
(Dalian University of Technology)
You-Nian Wang
(Dalian University of Technology)
*This work was financially supported by the National Natural Science Foundation of China (NSFC) (Grant Nos. 11935005, 12105035), the Fundamental Research Funds for the Central Universities (No. DUT21TD104).
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