73rd Annual Gaseous Electronics Virtual Conference
Volume 65, Number 10
Monday–Friday, October 5–9, 2020;
Time Zone: Central Daylight Time, USA.
Session Index
Session DM1: Tutorial II: Plasma Physics Fundamentals II
Chair: Steve Shannon, North Carolina State University
Monday, October 5, 2020
12:30PM - 2:00PM
Live
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DM1.00001: Solving the plasma fluid model in open source frameworks: Two-stream instability as a case study
Invited Speaker:
Venkattraman Ayyaswamy
Preview Abstract |
Monday, October 5, 2020
2:00PM - 2:15PM
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DM1.00002: Break (2:00pm - 2:15pm)
Preview Abstract |
Monday, October 5, 2020
2:15PM - 3:45PM
Live
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DM1.00003: Particle Methods for Revealing Kinetic Plasma Behavior
Invited Speaker:
Benjamin Yee
Preview Abstract |
Monday, October 5, 2020
3:45PM - 4:00PM
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DM1.00004: Break (3:45pm - 4:00pm)
Preview Abstract |
Monday, October 5, 2020
4:00PM - 4:30PM
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DM1.00005: Discussion (4:00pm - 4:30pm)
Preview Abstract |
Session DM2: Workshop IV: Plasma Enhanced Atomic Layer Etch/Atomic Layer Deposition
Chair: Sebastian Engelmann, IBM Research
Monday, October 5, 2020
12:45PM - 1:00PM
Live
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DM2.00001: Plasma Enhanced Atomic Layer Etch/Atomic Layer Deposition
Invited Speaker:
Sebastian Engelmann
Preview Abstract |
Monday, October 5, 2020
1:00PM - 1:45PM
Live
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DM2.00002: Plasma chemistry data and chemistry set optimisation approach for ALD/ALE modeling
Anna Dzarasova, Martin Hanicinec, Sebastian Mohr, Jonathan Tennyson
Preview Abstract |
Monday, October 5, 2020
1:45PM - 2:30PM
Live
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DM2.00003: Atomic Layer Etching of Metals with Anisotropy, Specificity and Selectivity
Jane Chang, Yantao Xia, Philippe Sautet, Xia Sang
Preview Abstract |
Monday, October 5, 2020
2:30PM - 3:15PM
Live
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DM2.00004: Reaction Network Analysis for Atomic Layer Deposition Processes
Invited Speaker:
Raymond Adomaitis
Preview Abstract |
Monday, October 5, 2020
3:15PM - 4:00PM
Live
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DM2.00005: Selective Etching Promoted by the Area Selective Growth of Deactivating Polymers.
Rudy Wojtecki
Preview Abstract |
Monday, October 5, 2020
4:00PM - 4:30PM
Live
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DM2.00006: Discussion (4:00pm - 4:30pm)
Abstract APS
Preview Abstract |
Session DM3: Workshop III: Realistic implementation of plasma‐surface interactions in simulations of technological plasmas
Chair: Aranka Derzsi, Wigner Research Centre for Physics, Hungary
Monday, October 5, 2020
1:00PM - 1:15PM
Live
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DM3.00001: Introduction: Realistic Implementation of Plasma-Surface Interactions in Simulations of Technological Plasmas
Invited Speaker:
Aranka Derzsi
Preview Abstract |
Monday, October 5, 2020
1:15PM - 1:45PM
Live
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DM3.00002: In-situ measurement of electron emission yields at plasma-exposed surfaces
Invited Speaker:
Mark Sobolewski
Preview Abstract |
Monday, October 5, 2020
1:45PM - 2:15PM
Live
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DM3.00003: Computationally assisted in-situ measurement of secondary electron emission coefficients in CCPs
Invited Speaker:
Benedek Horvath
Preview Abstract |
Monday, October 5, 2020
2:15PM - 2:45PM
Live
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DM3.00004: On the influence of surface quenching, electron emission and surface recombination on discharge properties
Invited Speaker:
Jon Tomas Gudmundsson
Preview Abstract |
Monday, October 5, 2020
2:45PM - 3:15PM
Live
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DM3.00005: 2D PIC simulations of realistic plasma-surface interactions in geometrically asymmetric capacitive radio frequency discharges
Invited Speaker:
Li Wang
Preview Abstract |
Monday, October 5, 2020
3:15PM - 3:45PM
Live
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DM3.00006: Kinetic Monte-Carlo modeling of plasma-surface interactions with realistic surfaces
Invited Speaker:
Daniil Marinov
Preview Abstract |
