Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session OR2: Plasma Etching I
10:00 AM–12:00 PM,
Thursday, October 15, 2015
Room: 308 AB
Chair: Michael Liberman, University of California, Berkeley
Abstract ID: BAPS.2015.GEC.OR2.4
Abstract: OR2.00004 : Surface rippling by oblique ion incidence during plasma etching of silicon: Experimental demonstration using sheath control plates
11:15 AM–11:30 AM
Preview Abstract Abstract
Authors:
Nobuya Nakazaki
(Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University)
Haruka Matsumoto
(Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University)
Koji Eriguchi
(Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University)
Kouichi Ono
(Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.OR2.4
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