Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session OR2: Plasma Etching I
10:00 AM–12:00 PM,
Thursday, October 15, 2015
Room: 308 AB
Chair: Michael Liberman, University of California, Berkeley
Abstract ID: BAPS.2015.GEC.OR2.5
Abstract: OR2.00005 : Apparatus and Method to Plasma Etch Inner Surface of the Varied Diameter Cylindrical Structure
11:30 AM–11:45 AM
Preview Abstract Abstract
Authors:
Janardan Upadhyay
(Old Dominion University)
Do Im
(Old Dominion University)
J. Peshl
(Old Dominion University)
S. Popovic
(Old Dominion University)
Anne-Marie Valente-Feliciano
(Thomas Jefferson National Accelerator Facility)
L. Phillips
(Thomas Jefferson National Accelerator Facility)
L. Vuskovic
(Old Dominion University)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.OR2.5
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