Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session OR2: Plasma Etching I
10:00 AM–12:00 PM,
Thursday, October 15, 2015
Room: 308 AB
Chair: Michael Liberman, University of California, Berkeley
Abstract ID: BAPS.2015.GEC.OR2.3
Abstract: OR2.00003 : Conceptual Design of Electron-Beam Generated Plasma Tools*
11:00 AM–11:15 AM
Preview Abstract
Abstract
Authors:
Ankur Agarwal
(Applied Materials Inc.)
Shahid Rauf
(Applied Materials Inc.)
Leonid Dorf
(Applied Materials Inc.)
Ken Collins
(Applied Materials Inc.)
David Boris
(Plasma Physics Division, Naval Research Laboratory)
Scott Walton
(Plasma Physics Division, Naval Research Laboratory)
*Partially supported by the NRL base program
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.OR2.3
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