Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session OR2: Plasma Etching I
10:00 AM–12:00 PM,
Thursday, October 15, 2015
Room: 308 AB
Chair: Michael Liberman, University of California, Berkeley
Abstract ID: BAPS.2015.GEC.OR2.2
Abstract: OR2.00002 : Advanced Simulation Technology to Design Etching Process on CMOS Devices*
10:30 AM–11:00 AM
Preview Abstract
Abstract
Author:
Nobuyuki Kuboi
(Sony Corporation)
*We thank Mr. T. Shigetoshi and Mr. T. Kinoshita of Sony Corporation for their assistance with the experiments.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.OR2.2
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