67th Annual Gaseous Electronics Conference
Volume 59, Number 16
Sunday–Friday, November 2–7, 2014;
Raleigh, North Carolina
Session Index
Session AM1: Advanced RF Systems for Plasma Control
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Show Abstracts |
Chair: David Coumou, MKS Instruments
Room: State EF
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Monday, November 3, 2014
8:00AM - 8:15AM
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AM1.00001: Introduction
David Coumou
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Monday, November 3, 2014
8:15AM - 9:00AM
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AM1.00002: Time-Modulated Inductively Coupled Plasmas for Advanced Dry Etching Processes
Invited Speaker:
Waheb Bishara Samer Banna
Preview Abstract |
Monday, November 3, 2014
9:00AM - 9:45AM
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AM1.00003: The Electrical Asymmetry Effect in capacitive RF plasmas: Past, Present, and Future
Invited Speaker:
J. Schulze, A. Derzsi, I. Korolov, S. Brandt, Z. Donko
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Monday, November 3, 2014
9:45AM - 10:15AM
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AM1.00004: Break
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Monday, November 3, 2014
10:15AM - 11:00AM
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AM1.00005: Control of Ion Energy Distributions Through the Phase Difference Between Multiple Frequencies in Capacitively
Invited Speaker:
Yiting Zhang Mark J. Kushner
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Monday, November 3, 2014
11:00AM - 11:45AM
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AM1.00006: EEDf, IEDf and some of the physics of the Non-ambipolar Electron Plasma (NEP)
Invited Speaker:
Lee Chen Zhiying Chen
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Monday, November 3, 2014
11:45AM - 1:00PM
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AM1.00007: Lunch
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Monday, November 3, 2014
1:00PM - 1:45PM
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AM1.00008: Centralized and Coherent Feedforward Impedance Tuning Control and Feedback Power Regulation for the Enhancement of RF Plasma Processing Systems
Invited Speaker:
David Coumou
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Monday, November 3, 2014
1:45PM - 2:30PM
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AM1.00009: Inductively Coupled Plasma Sources for Dry Etching and Annealing Processes
Invited Speaker:
Tomohiro Okumura
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Monday, November 3, 2014
2:30PM - 3:00PM
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AM1.00010: Panel Discussion
Preview Abstract |
