Plasma Physics Kinetics and Experiments to Optimize Extreme Ultraviolet Sources*

Laser-produced tin plasmas which emit extreme ultraviolet (EUV) radiation are used as the state-of-the-art short wavelength source for semiconductor lithography[1]. The properties of the laser-produced plasma can greatly affect the efficiency of the conversion of laser energy into EUV photons. Debris from the tin plasma, particularly energetic ions, can also disrupt the reliability of the light source by damaging collection optics. Current efforts aim to understand and model how plasma physics behavior affects both the conversion efficiency and debris production. We will detail approaches to tune the laser-generated plasma to balance EUV production against debris creation using a combination of particle-in-cell modeling [2] and experiments. 

[1] Versolato, Oscar O. "Physics of laser-driven tin plasma sources of EUV radiation for nanolithography." Plasma Sources Science and Technology 28, no. 8 : 083001 (2019) 

[2] S. Totorica, et al, "Acceleration mechanisms of energetic ion debris in laser- driven tin plasma EUV sources” Appl. Phys. Lett. 124, 174101 (2024)