NanoFrazor Lithography – from enabling novel devices in the lab towards realizing better products in the lab

The number of NanoFrazor lithography machines has been strongly growing predominantly due to advanced nanofabrication challenges at research facilities. The key distinguishing features of NanoFrazor lithography are sub-nanometer 3D grayscale lithography and accurate markerless overlay, both possible due to in-situ high-speed AFM imaging. More recently, the patterning process being free of charged particles proved to be a critical advantage when working with sensitive materials or device layers that are easily damaged. These unique capabilities led to a whole range of otherwise impossible demonstrations of novel devices. We will discuss the opportunities of NanoFrazor lithography as a manufacturing technology in industry.