Bulletin of the American Physical Society
APS March Meeting 2021
Volume 66, Number 1
Monday–Friday, March 15–19, 2021; Virtual; Time Zone: Central Daylight Time, USA
Session H71: Poster Session I (2:00pm - 4:00pm)
2:00 PM,
Tuesday, March 16, 2021
Abstract: H71.00057 : A universal method for depositing patterned materials in-situ*
Presenter:
Yifan CHEN
(Chinese University of Hong Kong)
Authors:
Yifan CHEN
(Chinese University of Hong Kong)
Siu Fai HUNG
(Chinese University of Hong Kong)
Sen YANG
(Chinese University of Hong Kong)
Kangwei Xia
(Chinese University of Hong Kong)
and material deposition. The complexity and harsh working conditions post serious limita-
tions for fabrication. Here, we introduce a single-step and easy-to-adapt method that can
deposit materials in-situ. Its methodology is based on the semiconductor nanoparticle as-
sisted photon-induced chemical reduction and optical trapping. This universal mechanism
can be used for depositing a large selection of materials including metals, insulators and
magnets, with quality on par with current technologies. Patterning with several materi-
als together with optical-diffraction-limited resolution and accuracy can be achieved from
macroscopic to microscopic scale. Furthermore, the setup is naturally compatible with op-
tical microscopy based measurements, thus sample characterisation and material deposition
can be realised in-situ. Various devices fabricated with this method in 2D or 3D show it is
ready for deployment in practical applications. This method will provide a distinct tool in
material technology.
*Financial support from CUHK start-up grant and Hong Kong RGC (GRF/ECS/24304617, GRF/14304618 and GRF/14304419) are gratefully acknowledged.
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