Bulletin of the American Physical Society
APS March Meeting 2021
Volume 66, Number 1
Monday–Friday, March 15–19, 2021; Virtual; Time Zone: Central Daylight Time, USA
Session E29: Semiconductor Qubits - Quantum Computing with Donor Spins I
8:00 AM–11:00 AM,
Tuesday, March 16, 2021
Sponsoring
Unit:
DQI
Chair: Matthew Donnelly, Univ of New South Wales
Abstract: E29.00012 : Digital Hydrogen Depassivation Lithography for Improving Precison of Donor Placement in Si*
10:36 AM–10:48 AM
Live
Presenter:
John Randall
(Zyvex Labs)
Authors:
John Randall
(Zyvex Labs)
James H.G. Owen
(Zyvex Labs)
Ehud Fuchs
(Zyvex Labs)
Robin Santini
(Zyvex Labs)
We describe a new digital exposure strategy that moves the tip in imaging mode to a position above a pixel then holds still while transitioning to lithography conditions and exposes all four H atoms in that pixel. Once the pixel is exposed, the tip is returned to imaging conditions and moved to the next pixel to be exposed. Exposure conditions can be optimized to increase the tip position tolerance to +/- 1.9Å. We also include functions for exposure completion, more stable current control, and tip position correction.
1 Hill, C. D. Sci. Adv. 1 (2015)
2 Wyrick, J. Adv. Funct. Mater. 29 (2019)
3 Randall, J. J. Vac. Sci. Technol. B 37 (2019)
*We acknowledge funding from the DOE contract DE-EE0008311
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