Bulletin of the American Physical Society
APS March Meeting 2021
Volume 66, Number 1
Monday–Friday, March 15–19, 2021; Virtual; Time Zone: Central Daylight Time, USA
Session B48: Proximity Effect and Andreev Reflection
11:30 AM–2:06 PM,
Monday, March 15, 2021
Sponsoring
Unit:
DCMP
Chair: Marcio de Andrade, Naval Information Warfare Center Pacific
Abstract: B48.00006 : Superconducting Proximity Effect on a Magnetically Doped Topological Insulator Controlled by Magnetization*
12:30 PM–12:42 PM
Live
Presenter:
Rikizo Yano
(IMaSS, Nagoya University)
Authors:
Rikizo Yano
(IMaSS, Nagoya University)
Masahiro Yamamoto
(Dep. of Appl. Phys., Nagoya University)
Kohei Tsumura
(Dep. of Appl. Phys., Nagoya University)
Hishiro T. Hirose
(Laboratory for Materials and Structures, Tokyo Institute of Technology)
Vasily S. Stolyarov
(TQPSS, Moscow Institute of Physics and Technology)
Yukio Tanaka
(Dep. of Appl. Phys., Nagoya University)
Hiromi Kashiwaya
(National Institute of Advanced Industrial Science and Technology)
Yasuhiro Asano
(Center of Topological Science and Technology, Hokkaido University)
Takao Sasagawa
(Laboratory for Materials and Structures, Tokyo Institute of Technology)
Satoshi Kashiwaya
(Dep. of Appl. Phys., Nagoya University)
In this study, we investigated the magnetization dependence of PE on an Nb/ Fe-doped Bi2Te2Se Josephson junction. We evaluated Ic-H characteristics before/after applying large magnetic fields. The Ic-H patterns show typical Fraunhofer-like patterns with slight hysteresis. After large magnetic fields (> 0.5 T), the patterns were drastically shift depending on the direction of the last large fields. This shift indicates that the critical currents are sensitive to the existing remnant magnetization. We also observed a transition-like behavior in the conductance spectrum, which may relate with a topological phase transition.
*This study was supported by JST CREST (Grant No. JPMJCR16F2) and KAKENHI (Grant Nos. JP15H05851, 15H05853, 16H03847, 18H01243, 18H01176, 20H01857, 20H00337, and 20H00131). Crystal growth was supported by the CRP of MSL-Tokyo Tech. The fabrication process was performed at the AIST-NPF, supported by NTPJ of the MEXT, Japan.
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