Bulletin of the American Physical Society
APS March Meeting 2021
Volume 66, Number 1
Monday–Friday, March 15–19, 2021; Virtual; Time Zone: Central Daylight Time, USA
Session B35: Topological Spintronics using Chiral Antiferromagnets
11:30 AM–2:30 PM,
Monday, March 15, 2021
Sponsoring
Unit:
GMAG
Chair: Collin Broholm, Johns Hopkins University
Abstract: B35.00001 : Large magneto-optical effects in the topological chiral antiferromagnet Mn3Sn
11:30 AM–12:06 PM
Live
Presenter:
Tomoya Higo
(University of Tokyo)
Authors:
Tomoya Higo
(University of Tokyo)
Huiyuan Man
(Stanford University)
Daniel B Gopman
(National Institute of Standards and Technology)
Liang Wu
(University of Pennsylvania)
Takashi Koretsune
(Tohoku University)
Olaf M Van T Erve
(United States Naval Research Laboratory)
Yury Kabanov
(National Institute of Standards and Technology)
Dylan N Rees
(University of California, Berkeley)
Yufan Li
(Johns Hopkins University)
Michi-To Suzuki
(Tohoku University)
Shreyas Patankar
(University of California, Berkeley)
Muhammad Ikhlas
(University of Tokyo)
Chia-Ling Chien
(Johns Hopkins University)
Ryotaro Arita
(RIKEN-CEMS)
Robert D Shull
(National Institute of Standards and Technology)
Joseph Orenstein
(University of California, Berkeley)
Satoru Nakatsuji
(University of Tokyo)
In this presentation, we will mainly talk about the magneto-optical properties of Mn3Sn [5]. We found that despite a negligibly small magnetization, Mn3Sn exhibits a large zero-field MOKE (~20 mdeg), comparable to that in ferromagnets. Our first-principles calculation has clarified that the ferroic ordering of cluster magnetic octupoles causes the MOKE even in its fully compensated AF state. This large MOKE further allows imaging of the octupole domains, strongly related to other TR-odd responses induced by the Berry curvature. We will also show that Mn3Sn thin films exhibit the large time-reversal-odd response as well as the bulk Mn3Sn [6]. These findings provide an important step for further developing optical and/or spintronics studies using AF materials [7,8].
[1] Jungwirth et al., Nat. Nanotech. 5, 231 (2016).
[2] Nakatsuji, Kiyohara, and Higo, Nature 527, 212 (2015).
[3] Ikhlas+, Tomita+ et al., Nat. Phys. 13, 1085 (2017).
[4] Kuroda+, Tomita+ et al., Nat. Mater. 16, 1090 (2017).
[5] Higo et al., Nat. Photon. 12, 73 (2018).
[6] Higo et al., APL 113, 202402 (2018).
[7] Matsuda et al., Nat. Commun. 11, 909 (2020).
[8] Tsai+, Higo+ et al., Nature 580, 680 (2020).
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