Bulletin of the American Physical Society
APS March Meeting 2020
Volume 65, Number 1
Monday–Friday, March 2–6, 2020; Denver, Colorado
Session W52: Thin Film Coatings and Applications
8:00 AM–10:48 AM,
Friday, March 6, 2020
Room: Mile High Ballroom 1E
Sponsoring
Unit:
DCMP
Chair: Daniel Dougherty, North Carolina State University
Abstract: W52.00014 : Ferroelectric polarization rotation through He irradiation induced uniaxial strain*
Presenter:
Andreas Herklotz
(University of Halle-Wittenberg)
Authors:
Andreas Herklotz
(University of Halle-Wittenberg)
Robert Roth
(University of Halle-Wittenberg)
Kathrin Dorr
(University of Halle-Wittenberg)
Niranjan Ramakrishnegowda
(University of Halle-Wittenberg)
Yogesh Sharma
(Oak Ridge National Laboratory)
Alessandro Mazza
(Oak Ridge National Laboratory)
Thomas Zac Ward
(Oak Ridge National Laboratory)
Here, we deploy low-energy He implantation as an alternative approach. Ion implantation induces uniaxial out-of-plane strain, while the in-plane strain remains fixed due to coherent growth on the substrate. We show that this kind of uniaxial strain engineering effectively leads to polarization rotation from in-plane towards out-of-plane as the uniaxial strain is increasing. We find that this polarization rotation can be achieved via two different mechanisms: (i) via a sequence of phase transitions related to changes of crystal symmetries and (ii) via a continuous shift of the ferroelectric domain ratio towards out-of-plane oriented domains.
*This effort was supported by the DFG SFB 762 and the US Department of Energy (DOE), Office of Basic Energy Sciences (BES), Materials Sciences and Engineering Division.
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