Bulletin of the American Physical Society
APS March Meeting 2020
Volume 65, Number 1
Monday–Friday, March 2–6, 2020; Denver, Colorado
Session C71: Poster Session I (2:00pm - 5:00pm)
2:00 PM,
Monday, March 2, 2020
Room: Exhibit Hall C/D
Abstract: C71.00014 : Fragmentation and Desorption of Surface-Immobilized DNA on PMMA and PAA Substrates for Sequencing Applications*
Presenter:
Ellen Guo
(Stony Brook University)
Authors:
Ellen Guo
(Stony Brook University)
Qinxi Liu
(Stony Brook University)
Kathy Xing
(Stony Brook University)
Kerui Yang
(Stony Brook University)
Luisa Pan
(Stony Brook University)
Jocelyn Zhu
(Stony Brook University)
Anthony Del Valle
(Stony Brook University)
Joseph Jennings
(Nassau Community College)
Jonathan Carl Sokolov
(Stony Brook University)
Producing ordered fragments of DNA would greatly simplify sequencing’s assembly problem. We studied the enzymatic cutting and desorption of surface-immobilized λ-DNA molecules on PMMA and PAA coated silicon wafers. Surfaces were dipped into 0.5-5.0 μg/mL DNA solutions and retracted at 1-10 mm/s speeds to stretch and immobilize (“molecularly comb”) DNAs on the surface. For PMMA, desorption was done in heated buffer solutions (DNase buffer, NEBuffer 3.1, pH-altered NEBuffer 3.1 (pH≈10) at 50-70°C). For PAA, which switches water-solubility by immersion in CaCl2 or NaCl solutions, complete desorption into saline solution by PAA dissolution was observed.
Relative to previous soft lithography methods, we employed a microfluidic method to improve DNA fragmentation. Holes in 1mm thick PDMS membranes were produced by piercing the PDMS with microneedles (d =250-400 μm) or by curing PDMS around the microneedles. PDMS layers with holes were pressed onto adsorbed DNAs and a DNAse I cutting enzyme solution was deposited on top. By applying a vacuum (125 Torr) above the solution, the low-volume chambers fill with solution and efficiently cut the DNA, as confirmed by fluorescence microscopy.
*We acknowledge support from the Louis Morin Charitable Trust and NYS Department of Economic Development.
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2025 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700