Bulletin of the American Physical Society
APS March Meeting 2019
Volume 64, Number 2
Monday–Friday, March 4–8, 2019; Boston, Massachusetts
Session B35: Silicon Spin Qubits
11:15 AM–2:03 PM,
Monday, March 4, 2019
BCEC
Room: 205B
Sponsoring
Unit:
DQI
Chair: Emily Pritchett, HRL Laboratories
Abstract: B35.00009 : Spin relaxation and dephasing in a 28SiGe QD with nanomagnet*
1:15 PM–1:27 PM
Presenter:
Tom Struck
(JARA-FIT Institute for Quantum Information, RWTH Aachen University, Germany)
Authors:
Tom Struck
(JARA-FIT Institute for Quantum Information, RWTH Aachen University, Germany)
Arne Hollmann
(JARA-FIT Institute for Quantum Information, RWTH Aachen University, Germany)
Veit Langrock
(JARA-FIT Institute for Quantum Information, FZ Jülich, Germany)
Tim Leonhardt
(JARA-FIT Institute for Quantum Information, RWTH Aachen University, Germany)
Andreas Schmidbauer
(Institut für Experimentelle und Angewandte Physik, Universität Regensburg, Germany)
Floyd Schauer
(Institut für Experimentelle und Angewandte Physik, Universität Regensburg, Germany)
Christian Neumann
(Institut für Experimentelle und Angewandte Physik, Universität Regensburg, Germany)
Nikolay V. Abrosimov
(Leibniz Institute for Crystal Growth, Berlin, Germany)
Dominique Bougeard
(Institut für Experimentelle und Angewandte Physik, Universität Regensburg, Germany)
Lars R. Schreiber
(JARA-FIT Institute for Quantum Information, RWTH Aachen University, Germany)
Here, we study the spin relaxation and dephasing in an MBE-grown 28Si/SiGe device with a residual 29Si concentration of less than 60 ppm. In our devices, instead of using a micromagnet, one of the electrostatic gates is replaced by a cobalt nanomagnet to generate the magnetic field gradient required for electrical dipole spin resonance. We find a maximum T1 = 480 ms and present a detailed study of the spin relaxation time T1 as a function of magnetic field. We observe a spin relaxation hotspot due to enhanced spin-valley mixing at a Zeeman energy of 207 µeV and find this large valley splitting to be tunable with the gate voltages. Finally, we discuss the long spin dephasing times T2* and T2echo obtained in this device.
[1] J. Yoneda et al., Nat. Nanotechnology 13, 102 (2018).
*This project is sponsored by the German Research Foundation (DFG).
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