Bulletin of the American Physical Society
APS March Meeting 2018
Volume 63, Number 1
Monday–Friday, March 5–9, 2018; Los Angeles, California
Session R17: Graphene and Topological Insulator Surfaces
8:00 AM–10:48 AM,
Thursday, March 8, 2018
LACC
Room: 306A
Sponsoring
Units:
DCMP DMP
Chair: James Williams, University of Maryland, College Park
Abstract ID: BAPS.2018.MAR.R17.14
Abstract: R17.00014 : Induced Robust Topological Order on an Ordinary Insulator Heterostructured with a Strong Topological Insulator*
10:36 AM–10:48 AM
Presenter:
Bin LI
(The University of Hong Kong)
Authors:
Bin LI
(The University of Hong Kong)
Qiangsheng Lu
(Southern University of Science and Technology)
Shuigang Xu
(The Hong Kong University of Science and Technology)
Xiangbin Cai
(The Hong Kong University of Science and Technology)
YIPU XIA
(The University of Hong Kong)
Wingkin Ho
(The University of Hong Kong)
Ning Wang
(The Hong Kong University of Science and Technology)
Hailang Qin
(Southern University of Science and Technology)
Gan Wang
(Southern University of Science and Technology)
Chang Liu
(Southern University of Science and Technology)
MAOHAI XIE
(The University of Hong Kong)
*The work described in this paper was supported in parts from a grant of the SRFDP and RGC ERG Joint Research Scheme of Hong Kong Research Grant Council (RGC) and the Ministry of Education of China (No. M-HKU709/12) and from a Collaborative Research Fund (HKU9/CRF/13G) sponsored by the RGC of Hong Kong Sp
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2018.MAR.R17.14
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