Process Monitoring to Improve Reliability and Yield for Superconducting Circuits*

As the scale and complexity of superconducting circuits increases, characterizing and monitoring the underlying processes will become increasingly important. MIT Lincoln Laboratory uses process control structures to characterize devices, track key parameters, and support the development of more complex designs. We will describe the development of software and database capabilities that allow us to visualize cross-wafer patterns, examine trends, and monitor process stability.