Bulletin of the American Physical Society
APS March Meeting 2017
Volume 62, Number 4
Monday–Friday, March 13–17, 2017; New Orleans, Louisiana
Session B6: Thin Films - Block Copolymers
11:15 AM–2:15 PM,
Monday, March 13, 2017
Room: 265
Sponsoring
Unit:
DPOLY
Chair: Bryan Vogt, University of Akron
Abstract ID: BAPS.2017.MAR.B6.13
Abstract: B6.00013 : Line and Dot Dual Nanopatterns by using Miktoarm Block Copolymer with Photocleavable Linker
2:03 PM–2:15 PM
Preview Abstract
Abstract
Authors:
Chungryong Choi
(Pohang Univ of Sci & Tech)
Jichoel Park
(Pohang Univ of Sci & Tech)
K. L. Vincent Joseph
(Pohang Univ of Sci & Tech)
Jae Yong Lee
(Pohang Univ of Sci & Tech)
Seonghyeon Ahn
(Pohang Univ of Sci & Tech)
Jongheon Kwak
(Pohang Univ of Sci & Tech)
Jin Kon Kim
(Pohang Univ of Sci & Tech)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2017.MAR.B6.13
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