Monday, March 2, 2015
2:30PM - 2:42PM
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D42.00001: Minimal Topographic Surfaces for Directed Self-assembly of Cylinder-forming Block Copolymer Thin films with Lateral Order
Jaewon Choi, Kenneth Carter, Thomas Russell
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Monday, March 2, 2015
2:42PM - 2:54PM
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D42.00002: Pathways toward unidirectional alignment in block copolymer thin films on faceted surfaces
Ilja Gunkel, Xiaodan Gu, Abhinav Sarje, Alexander Hexemer, Thomas Russell
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Monday, March 2, 2015
2:54PM - 3:06PM
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D42.00003: Combining Graphoepitaxy and Electric Fields towards Uniaxial Alignment of Solvent-annealed Cylinder forming Poly(styrene)-\textit{block}-poly(dimethylsiloxane) block copolymers
Christine Kathrein, Wubin Bai, Larisa Tsarkova, Tao Huang, Apostolos Avgeropoulos, Alexander Boker, Caroline Ross
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Monday, March 2, 2015
3:06PM - 3:42PM
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D42.00004: Self-Assembly of Diblock Copolymers on Modified and Patterned Surfaces
Invited Speaker:
Venkat Ganesan
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Monday, March 2, 2015
3:42PM - 3:54PM
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D42.00005: Optimizing the Morphology Characterization of Block Copolymer Directed Self-Assembly Thin Films using Inverse Genetic Algorithms
Adam Hannon, Daniel Sunday, Donald Windover, Christopher Liman, Juan de Pablo, Joseph Kline
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Monday, March 2, 2015
3:54PM - 4:06PM
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D42.00006: Instantaneous Formation of Block Copolymer Patterns via Solvo-Thermal Casting Process
Hyun Jung Jung, Sanghoon Woo, June Huh, Joona Bang
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Monday, March 2, 2015
4:06PM - 4:18PM
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D42.00007: Cyclic Solvent Vapor Annealing for Rapid, Robust Vertical Orientation of Features in BCP Thin Films
Sean Paradiso, Kris Delaney, Glenn Fredrickson
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Monday, March 2, 2015
4:18PM - 4:30PM
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D42.00008: Decoupling Substrate Surface Interactions in Block Polymer Thin Film Self-Assembly
Cameron Shelton, Thomas Epps
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Monday, March 2, 2015
4:30PM - 4:42PM
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D42.00009: A Block Copolymer Self-Assembly Approach for 3D Nanoconfined Dopants in Semiconductors
Bhooshan Popere, Boris Russ, William Chang, Andrew Heitsch, Peter Trefonas, Rachel Segalman
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Monday, March 2, 2015
4:42PM - 4:54PM
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D42.00010: Defect motion and annihilation in block copolymer thin films
Marcus Mueller, Weihua Li
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Monday, March 2, 2015
4:54PM - 5:06PM
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D42.00011: Accelerating the search for globally stable block polymer microphases using genetic algorithms
Carol Tsai, Kris Delaney, Glenn Fredrickson
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Monday, March 2, 2015
5:06PM - 5:18PM
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D42.00012: Kinetic Aspects of Defect Annihilation in Block Copolymer Thin Films on Patterned Substrates.
Su-Mi Hur, Paulina Rincon-Delgadillo, Vikram Thapar, Abelardo Ram\'Irez-Hern\'{a}ndez, Gurdaman Khaira, Paul Nealey, Marcus M\"{u}ller, Juan de Pablo
Preview Abstract |