Tuesday, March 16, 2010
2:30PM - 3:06PM
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L18.00001: Dillon Medal Break
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Tuesday, March 16, 2010
3:06PM - 3:42PM
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L18.00002: Directed Self-assembly for Lithography Applications
Invited Speaker:
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Tuesday, March 16, 2010
3:42PM - 3:54PM
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L18.00003: Directed Self-assembly of Block Copolymer Thin Films on 2D Chemical Patterns Made by Electro-oxidation Nanolithography
Ji Xu, Thomas Russell, Antonio Checco, Benjamin Ocko
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Tuesday, March 16, 2010
3:54PM - 4:06PM
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L18.00004: Electric Field-Assisted Dip-Pen Nanolithography on P4VP Polymer Films
Xiaohua Wang, Suji Uppalapati, Xin Wang, Rodolfo Fernandez, Mingdi Yan, Andres La Rosa
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Tuesday, March 16, 2010
4:06PM - 4:18PM
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L18.00005: Orientation Control of Microphase-Separated Domains of Block Copolymer Thin Films Placed on Surfaces with Tunable Roughness
Youngwoo Choo, Hyo Seon Suh, Taehee Kim, Ki-Bum Kim, Kookheon Char
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Tuesday, March 16, 2010
4:18PM - 4:30PM
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L18.00006: Self-Assembly of Block Copolymer on Soft Textured Substrate
Dong Hyun Lee, Soojin Park, Sung Woo Hong, Thomas Russell
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Tuesday, March 16, 2010
4:30PM - 4:42PM
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L18.00007: Self-Assembled Polymer Nanostructures Formed from Homopolymers Induced by UV and Solvent Exposure
Mingdi Yan, Sailaja Chada, Bradford Paik
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Tuesday, March 16, 2010
4:42PM - 4:54PM
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L18.00008: Templated Self-Assembly of Highly Ordered Square Arrays from an ABC Triblock Terpolymer
Jeong Gon Son, Vivian P. Chuang, Jessica Gwyther, Jae-Byum Chang, Karl K. Berggren, Ian Manners, Caroline A. Ross
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Tuesday, March 16, 2010
4:54PM - 5:06PM
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L18.00009: Highly Oriented and Aligned Line Patterns of Block Copolymer over Macroscopic Areas
Sung Woo Hong, Dong Hyun Lee, Soojin Park, Ting Xu, Thomas P. Russell
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Tuesday, March 16, 2010
5:06PM - 5:18PM
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L18.00010: Effect of chain extender on the phase behavior and morphology of high hard block content polyurethanes
Achilleas Tsiotas, Chris Lindsay, Alberto Saiani
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Tuesday, March 16, 2010
5:18PM - 5:30PM
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L18.00011: Reversible structuring of azobenzene polymer films by surface plasmons
Tobias Koenig, Svetlana Santer
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