2009 APS March Meeting
Volume 54, Number 1
Monday–Friday, March 16–20, 2009;
Pittsburgh, Pennsylvania
Session A5: Nanostructuring with Ions
8:00 AM–11:00 AM,
Monday, March 16, 2009
Room: 401/402
Sponsoring
Unit:
FIAP
Chair: John Melngailis, University of Maryland
Abstract ID: BAPS.2009.MAR.A5.4
Abstract: A5.00004 : Helium Ion Imaging and Milling at the Nanometer Dimensions
9:48 AM–10:24 AM
Preview Abstract
Abstract
Author:
Bin Ming
(NIST)
The helium ion microscope (HeIM) is a new, powerful instrument for
nano-metrology and nanotechnology. As an emerging imaging and measurement
tool it offers several advantages over the traditional scanning electron
microscope (SEM) currently in use in research and manufacturing facilities
across the world. First, resolution 2 to 4 times better than that from
comparable SEMs is theoretically possible, due to the very high source
brightness and the short wavelength of the helium ions. Ion images with
unprecedented resolution have been routinely collected on a wide range of
samples with sub-nanometer features. More importantly, the interaction
volume of the helium ion beam in the sample is substantially different in
its size and shape from that of the electron beam in an SEM. As a
consequence, the signals generated, especially secondary electrons, reveal
more surface details. Imaging by the HeIM can further benefit from the
superb depth of field and the fact that He ion imaging is less susceptible
to sample charging. In addition, it is possible to compensate for charging
by the use of an electron flood gun. Scattered He ions produced as a result
of Rutherford scattering of the incident ions on the target nuclei can
provide material contrast information that can be used for quantitative
compositional analysis.
Beyond imaging, the HeIM is a potent tool for milling and modifying surface
structures at the nanometer scale, due to the relatively low mass of the
helium ion, the narrow ion beam, and especially the low beam currents. It is
possible to drill close to 10 nm diameter holes and mill other nanoscale
structures that cannot be fabricated with any other method. It is expected
that, as with the electron beam, it is feasible to expose resist and deposit
various materials with He ion beam irradiation. The work is at its
exploratory stage, and likely soon will yield more exciting results.
This presentation will report on some of the newest research work on the
NIST helium ion microscope.
* Contribution of the National Institute of Standards and Technology; not
subject to copyright
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2009.MAR.A5.4