2009 APS March Meeting 
Volume 54, Number 1
Monday–Friday, March 16–20, 2009;
Pittsburgh, Pennsylvania
Session A5: Nanostructuring with Ions
8:00 AM–11:00 AM, 
Monday, March 16, 2009
Room: 401/402
Sponsoring
Unit: 
FIAP
Chair: John Melngailis, University of Maryland
Abstract ID: BAPS.2009.MAR.A5.4
Abstract: A5.00004 : Helium Ion Imaging and Milling at the Nanometer Dimensions
9:48 AM–10:24 AM
Preview Abstract
  
  Abstract  
Author:
Bin Ming
(NIST)
The helium ion microscope (HeIM) is a new, powerful instrument for 
nano-metrology and nanotechnology. As an emerging imaging and measurement 
tool it offers several advantages over the traditional scanning electron 
microscope (SEM) currently in use in research and manufacturing facilities 
across the world. First, resolution 2 to 4 times better than that from 
comparable SEMs is theoretically possible, due to the very high source 
brightness and the short wavelength of the helium ions. Ion images with 
unprecedented resolution have been routinely collected on a wide range of 
samples with sub-nanometer features. More importantly, the interaction 
volume of the helium ion beam in the sample is substantially different in 
its size and shape from that of the electron beam in an SEM. As a 
consequence, the signals generated, especially secondary electrons, reveal 
more surface details. Imaging by the HeIM can further benefit from the 
superb depth of field and the fact that He ion imaging is less susceptible 
to sample charging. In addition, it is possible to compensate for charging 
by the use of an electron flood gun. Scattered He ions produced as a result 
of Rutherford scattering of the incident ions on the target nuclei can 
provide material contrast information that can be used for quantitative 
compositional analysis.
Beyond imaging, the HeIM is a potent tool for milling and modifying surface 
structures at the nanometer scale, due to the relatively low mass of the 
helium ion, the narrow ion beam, and especially the low beam currents. It is 
possible to drill close to 10 nm diameter holes and mill other nanoscale 
structures that cannot be fabricated with any other method. It is expected 
that, as with the electron beam, it is feasible to expose resist and deposit 
various materials with He ion beam irradiation. The work is at its 
exploratory stage, and likely soon will yield more exciting results.
This presentation will report on some of the newest research work on the 
NIST helium ion microscope.
* Contribution of the National Institute of Standards and Technology; not 
subject to copyright
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2009.MAR.A5.4