Bulletin of the American Physical Society

2006 APS March Meeting

Monday–Friday, March 13–17, 2006; Baltimore, MD

Session Index

Session W24: Focus Session: Lithography	Show Abstracts
Sponsoring Units: DPOLY Chair: Ronald Jones, National Institute of Standards and Technology Room: Baltimore Convention Center 321

Thursday, March 16, 2006 2:30PM - 3:06PM		W24.00001: Nanoimprint Lithography: Process Induced Stresses and Pattern Stability Invited Speaker: Preview Abstract
Thursday, March 16, 2006 3:06PM - 3:42PM		W24.00002: Nanometer-scale control of the crystallization of oligomers and polymers. Invited Speaker: Preview Abstract
Thursday, March 16, 2006 3:42PM - 3:54PM		W24.00003: UV Polarizer Fabricated by Diblock Copolymer Lithography Koji Asakawa, Vincent Pelletier, Mingshaw Wu, Douglas H. Adamson, Richard A. Register, Paul M. Chaikin Preview Abstract
Thursday, March 16, 2006 3:54PM - 4:06PM		W24.00004: Simple Analytic Model for Nanowire Array Polarizers Vincent Pelletier, Koji Asakawa, Mingshaw Wu, Richard Register, Paul Chaikin Preview Abstract
Thursday, March 16, 2006 4:06PM - 4:18PM		W24.00005: Robust Nanopatterns from Self-Assembly of a Diblock Copolymer and an Inorganic Precursor Ho-Cheol Kim, Linnea Sundstrom, Leslie Krupp, Eugene Delenia, Charles Rettner, Martha Sanchez, Mark Hart, Ying Zhang Preview Abstract
Thursday, March 16, 2006 4:18PM - 4:30PM		W24.00006: Fabrication of inorganic photonic crystals from interference lithography Jun Hyuk Moon, Shu Yang Preview Abstract
Thursday, March 16, 2006 4:30PM - 4:42PM		W24.00007: Effects on Low Voltage Electron Beam Lithography Mehdi Bolorizadeh, David C. Joy Preview Abstract
Thursday, March 16, 2006 4:42PM - 4:54PM		W24.00008: Hierarchical Organization of Nanoparticle Composites through Nano-Imprinting Azar Alizadeh, Chris Keimel, Kenneth Conway, Andrea Peters Preview Abstract
Thursday, March 16, 2006 4:54PM - 5:06PM		W24.00009: Mesoscale Simulation of the Lithography Process Grant Willson, Gerard Schmid, Jason Meiring Preview Abstract
Thursday, March 16, 2006 5:06PM - 5:18PM		W24.00010: New Directions in 3-D Multiphoton Lithography. John Fourkas, Christopher LaFratta, Richard Farrer, Linjie Li, Michael Naughton Preview Abstract
Thursday, March 16, 2006 5:18PM - 5:30PM		W24.00011: High efficient LEDs having columnar structure surface fabricated by block copolymer lithography Akira Fujimoto, Koji Asakawa Preview Abstract

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Bulletin of the American Physical Society

2006 APS March Meeting

Monday–Friday, March 13–17, 2006; Baltimore, MD

Session Index

Session W24: Focus Session: Lithography

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