77th Annual Gaseous Electronics Conference
Monday–Friday, September 30–October 4 2024;
San Diego, California
Session Index
Session ET1: Plasma Diagnostics I
Chair: Claudia Lazzaroni, LSPM CNRS
Room: Shutters West I and II
Tuesday, October 1, 2024
8:00AM - 8:15AM
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ET1.00001: Comprehensive spatial mapping of plasma parameters in low-pressure nitrogen plasma by optical emission spectroscopy
Jonggu Han, Se Youn Moon
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Tuesday, October 1, 2024
8:15AM - 8:30AM
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ET1.00002: Fiber PROES: Phase-resolved optical emission spectroscopy by time-correlated photon counting through optical fibers
Julian Schulze, Florian Beckfeld, Ihor Korolov, Michael Hoefner, Friedrich Witek
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Tuesday, October 1, 2024
8:30AM - 8:45AM
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ET1.00003: Investigation of a millimeter nanosecond spark discharge at the interface of two immiscible liquids by time-resolved emission spectroscopy and ICCD imaging
audren dorval, Constance Latreille, Ahmad Hamdan, Luc Stafford
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Tuesday, October 1, 2024
8:45AM - 9:00AM
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ET1.00004: Revisiting optical actinometry to utilize multiple argon line ratios for determination of absolute radical densities
Michael Mo, Shih-Nan Hsiao, Fatima Jenina T Arellano, Makoto Sekine, Masaru Hori, Nikolay Britun
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Tuesday, October 1, 2024
9:00AM - 9:15AM
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ET1.00005: Modified State Enhanced Actinometry for measuring atomic oxygen density in a micro-scaled atmospheric pressure plasma jet
Kittawat Poonsawat, Erik Wagenaars
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Tuesday, October 1, 2024
9:15AM - 9:30AM
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ET1.00006: Bayesian evaluation of broadband argon emission spectra for the determination of excited state population densities and temperatures
Dan Fries, Todd Oliver, Noel T Clemens, Philip L Varghese
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Session ET2: Plasma Etching I
Chair: Pingshan Luan, University of Maryland College Park
Room: Shutters West I and II
Tuesday, October 1, 2024
10:00AM - 10:30AM
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ET2.00001: Physical and chemical effects in low temperature etching of memory devices
Invited Speaker:
Thorsten Lill
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Tuesday, October 1, 2024
10:30AM - 10:45AM
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ET2.00002: Digital Twins for Plasma-Surface Interactions in Atomic Layer Etching
David Barry Graves, Joseph R Vella
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Tuesday, October 1, 2024
10:45AM - 11:00AM
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ET2.00003: Effect of Secondary Electron Emission on Surface Charging during Plasma Etching for Microelectronics Fabrication
Chenyao Huang, Steven C Shannon, Mark Jay Kushner
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Tuesday, October 1, 2024
11:00AM - 11:15AM
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ET2.00004: Process Control of Plasma Etching of SiN, SiO2 and poly-Si films via Enhanced Fragmentation of CHF2CF3 and CF3CH3, CHF2CH3
Trung Nguyen Tran, Toshio Hayashi, Hiroshi Iwayama, Shih-Nan Hsiao, Makoto Sekine, Masaru Hori, Kenji Ishikawa
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Tuesday, October 1, 2024
11:15AM - 11:30AM
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ET2.00005: Characterization and Effects of Fluorine-Containing Ionic Liquid Ion Beams on Metal-Coated Substrates
Nazli Turan, Charlie Ryan
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Tuesday, October 1, 2024
11:30AM - 11:45AM
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ET2.00006: Extraction and Transport of Positive and Negative Ions in Plasma Etch Applications
Sergey Voronin, Nicholas Smieszek, Carl Lynwood Smith, Qi Wang, Akiteru Ko
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Session ET3: Modeling & Simulation III
Chair: Bhaskar Chaudhury, Group in Computational Science and HPC, DA-IICT, Gandhinagar, India
Room: Shutters West I and II
Tuesday, October 1, 2024
1:30PM - 1:45PM
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ET3.00001: Full-Fluid Moment Model for Gas Breakdown and Low Temperature, Partially Magnetized Plasmas
Adnan Mansour, Ken Hara
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Tuesday, October 1, 2024
1:45PM - 2:00PM
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ET3.00002: Electron dynamics in capacitively coupled argon plasmas with a structured cathode
Xingyi Shi, Han Luo, Kallol Bera, Shahid Rauf, Ihor Korolov, Julian Schulze, Jan Guttmann
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Tuesday, October 1, 2024
2:00PM - 2:30PM
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ET3.00003: High-order moment closures for fluid models in weakly-ionized plasmas
Invited Speaker:
Alejandro Alvarez Laguna
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Tuesday, October 1, 2024
2:30PM - 2:45PM
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ET3.00004: Modeling of Intermediate Pressure Capacitively Coupled N2 and Ar Plasmas
Shahid Rauf, Abhishek Verma, Rupali Sahu, Nakul Nuwal, Kallol Bera
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Tuesday, October 1, 2024
2:45PM - 3:00PM
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ET3.00005: Development of a performance portable non-equilibrium plasma fluid solver on adaptive grids
Hari Sitaraman, Nicholas Deak
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Tuesday, October 1, 2024
3:00PM - 3:15PM
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ET3.00006: Mechanism of unintended breakdowns in advanced plasma sources in the semiconductor Industry
Willca Villafana, Igor D Kaganovich, Sunghyun Son
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Tuesday, October 1, 2024
3:15PM - 3:30PM
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ET3.00007: PIC-MCC simulations of a GEC reactor using WarpX on GPUs
Revathi Jambunathan, Remi Lehe, Andrew Myers, Jean-Luc Vay, Weiqun Zhang
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