Bulletin of the American Physical Society
77th Annual Gaseous Electronics Conference
Monday–Friday, September 30–October 4 2024; San Diego, California
Session DR5: Plasma Diagnostics V
4:00 PM–5:30 PM,
Thursday, October 3, 2024
Room: Shutters East I and II
Chair: Christophe Laux, CentraleSupelec, University Paris Saclay
Abstract: DR5.00002 : Experimental study of intermediate-Pressure RF-CCP in Ar-O2 mixtures*
4:30 PM–4:45 PM
Presenter:
Shu Zhang
(Lpp, Ecole Polytechnique)
Authors:
Shu Zhang
(Lpp, Ecole Polytechnique)
Garrett Curley
(LPP-CNRS, Ecole Polytechnque, Palaiseau, France)
Jean-Paul Booth
(LPP-CNRS)
Even small (5%) addition of O2 to Ar strongly reduces the electron density and drastically changes the discharge impedance. Further oxygen addition (up to 100%) continues these trends, but more weakly. At high pressures the plasma becomes much more resistive. This can be attributed to the strong inelastic electron collision processes in oxygen, as well as the generation of negative ions. In some conditions (certain pressure and power), the O atom density passes through a maximum as the Ar % is increased, due to the competition between decreased O2 feedstock and increased electron density/dissociation rate. While in most conditions, the O density decreases monotonically with Ar addition, although the O2 dissociation fraction increases consistently, approaching 70%.
*We thankApplied Materials and Fédération de Recherche PLAS@PAR for financial support
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700