Bulletin of the American Physical Society
76th Annual Gaseous Electronics Conference
Volume 68, Number 9
Monday–Friday, October 9–13, 2023; Michigan League, Ann Arbor, Michigan
Session ER2: Modeling & Simulation IV: Low Pressure Plasma Sources
10:00 AM–12:00 PM,
Thursday, October 12, 2023
Room: Michigan League, Vandenberg
Chair: Kentaro Hara, Stanford University
Abstract: ER2.00001 : Plasma Modeling and Diagnostics in Semiconductor Equipment Design
10:00 AM–10:30 AM
Presenter:
Saravanapriyan Sriraman
(Lam Research)
Author:
Saravanapriyan Sriraman
(Lam Research)
In this presentation, the crucial role plasma modeling and diagnostics play in guiding the design of plasma etch solutions to develop state-of-the-art Plasma Etch Chamber technology will be discussed. Modeling and diagnostics are essential not only to understand chamber characteristics and etch mechanisms but also to accelerate hardware development to meet customer time-critical needs. Different types of plasma modeling tools commonly used in Plasma Etch Chamber development with reference to findings from literature and work undertaken at Lam Research will be presented. The continued relevance of plasma modeling and diagnostics in Semi equipment design and thoughts on the future direction for angstrom-level etching will be covered.
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700