75th Annual Gaseous Electronics Conference
Volume 67, Number 9
Monday–Friday, October 3–7, 2022;
Sendai International Center, Sendai, Japan
The session times in this program are intended for Japan Standard Time zone in Tokyo, Japan (GMT+9)
Session Index
Session FW1: Modeling - Plasma Processing and Chemistry I
Chair: Tomoyuki Murakami, Seikei Univ
Room: Sendai International Center Shirakashi 1
Wednesday, October 5, 2022
8:00AM - 8:15AM
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FW1.00001: Particle-in-Cell Modeling of Electron-Beam Generated Low Electron Temperature Plasma
Shahid Rauf, Dmytro Sydorenko, Sierra E Jubin, Willca Villafana, Stephane A Ethier, Alexander V Khrabrov, Igor D Kaganovich
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Wednesday, October 5, 2022
8:15AM - 8:30AM
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FW1.00002: Characterization of a transformer-coupled remote plasma source chamber using a fluids-based, multiphysics plasma model
Scott Polak, Abhra Roy, Jun-Chieh Wang, Kailash Meher, Veera Venkata Rao
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Wednesday, October 5, 2022
8:30AM - 8:45AM
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FW1.00003: Numerical investigation of vacuum ultraviolet emission in Ar-O2 inductively coupled plasmas
Michel Osca Engelbrecht, Christopher P Ridgers, Andrew R Gibson
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Wednesday, October 5, 2022
8:45AM - 9:00AM
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FW1.00004: Effects of amplitude modulation discharge on behavior of oxygen ions in Ar/O2 capacitively coupled plasma studied by particle-in-cell/Monte Carlo collision model
Iori Nagao, Akihiro Yamamoto, Yuma Yamamoto, Kunihiro Kamataki, Takamasa Okumura, Naoto Yamashita, Naho Itagaki, Kazunori Koga, Masaharu Shiratani
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Wednesday, October 5, 2022
9:00AM - 9:15AM
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FW1.00005: Plasma species and reaction dynamic-oriented global model studies for microscale argon discharges
De-Qi Wen, Peng Zhang, You-Nian Wang, John P. Verboncoeur
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Wednesday, October 5, 2022
9:15AM - 9:30AM
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FW1.00006: Kinetics of non-equilibrium plasma in water vapor- and hydrocarbon-containing gaseous mixtures
Andrey Starikovskiy, Nickolay Aleksandrov, Eduard Bazelyan, Alexander Ponomarev
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Session FW5: Atomic Layer Processes
Chair: Hiroki Kondo, Nagoya University, Japan
Room: Sendai International Center Shirakashi 1
Wednesday, October 5, 2022
2:30PM - 3:00PM
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FW5.00001: Optimisation and Understanding of Plasma Enhanced Atomic Layer Deposition Processes Using Quasi In-situ X-ray Photoelectron Spectroscopy
Invited Speaker:
Robert O'Connor
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Wednesday, October 5, 2022
3:00PM - 3:15PM
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FW5.00002: Damage mitigation in atomic layer etching of GaN by cyclic exposure of BCl3 gas and F2 added Ar plasma at high substrate temperature
Shohei Nakamura, Atsushi Tanide, Masafumi Kawagoe, Soichi Nadahara, Kenji Ishikawa, Osamu Oda, Masaru Hori
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Wednesday, October 5, 2022
3:15PM - 3:30PM
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FW5.00003: Topographically-selective Atomic Layer Etching of SiO2 using fluorine-containing plasma
Airah P Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, Masaru Hori
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Wednesday, October 5, 2022
3:30PM - 4:00PM
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FW5.00004: Plasma-assisted thermal-cyclic atomic-layer etching for selective removal of thin films
Invited Speaker:
Kazunori Shinoda
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