Bulletin of the American Physical Society
75th Annual Gaseous Electronics Conference
Monday–Friday, October 3–7, 2022;
Sendai International Center, Sendai, Japan
The session times in this program are intended for Japan Standard Time zone in Tokyo, Japan (GMT+9)
Session HT4: Poster Session I (4:00-6:00pm, JST)
4:00 PM,
Tuesday, October 4, 2022
Sendai International Center
Room: Sakura 1
Abstract: HT4.00079 : Thin plasma-polymerised layers on PET-substrates under the influence of NaOH solution
Presenter:
Jana Schöne
(Chair of Electrical Engineering and Plasma Technology, Ruhr-Universität Bochum, Germany)
Authors:
Jana Schöne
(Chair of Electrical Engineering and Plasma Technology, Ruhr-Universität Bochum, Germany)
Marcel Rudolph
(Chair of Electrical Engineering and Plasma Technology, Ruhr-Universität Bochum, Germany)
Jonathan Jenderny
(Chair of Electrical Engineering and Plasma Technology, Ruhr-Universität Bochum, Germany)
Peter Awakowicz
(Chair of Electrical Engineering and Plasma Technology, Ruhr-Universität Bochum, Germany)
For the experiment, PET-foils and Si-Wafers are coated. Therefore, a possible interlayer (3 nm) and barrierlayer (30 nm) are deposited with a pulsed microwave plasma. The HMDSO-based protection layer has a thickness of 30 nm. The process parameters for the corrosion protection are varied to identify a correlation between the parameters and the resistance. To assess the resistance to NaOH solution, an analysis of oxygen permeation, Fourier-transformation measurement, and SEM-examination are used. Optical emission spectroscopy is done to analyse the electron density, electron temperature, and gas temperature.
The presented results correlate the power and pulsing during the deposition process with the layers’ resistance against NaOH solution. A lower power increases the resistance. With pulsing of 2 ms/160 ms compared to 1 ms/160 ms a layer is deposited, which has a higher resistance to NaOH solution.
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