Bulletin of the American Physical Society
75th Annual Gaseous Electronics Conference
Volume 67, Number 9
Monday–Friday, October 3–7, 2022;
Sendai International Center, Sendai, Japan
The session times in this program are intended for Japan Standard Time zone in Tokyo, Japan (GMT+9)
Session GR5: Diamond Like Carbon Deposition
4:00 PM–6:00 PM,
Thursday, October 6, 2022
Sendai International Center
Room: Shirakashi 2
Chair: Kunihiro Kamataki, Kyushu University
Abstract: GR5.00001 : Effect of pulse width on deposition of diamond-like carbon on high power pulsed magnetron sputtering*
4:00 PM–4:15 PM
Presenter:
Takayuki Ohta
(Meijo university)
Authors:
Takayuki Ohta
(Meijo university)
Jo Matsushima
(Meijo university)
Sota Okumura
(Meijo university)
Akinori Oda
(Chiba Institute of Technology)
Hiroyuki Kousaka
(Gifu University)
The frequency of applied pulse to the carbon target was 400 Hz and no substrate bias voltage was applied. The gas flow rate of Ar was 5 sccm and the pressure was 0.5 Pa. The distance between the target and the orifice was 80 mm.
ID/IG ratio, evaluated by Raman scattering spectroscopy, decreased from 1.13 to 0.80 with decreasing the pulse width from 50 to 20 µs under the applied average power density of 1.97W/cm2. On the other hand, ID/IG ratio was constant for any pulse width under constant peak power density of 1.5kW/cm2. These results indicate that the peak power density is essential to characterize the film density of the DLC in comparison with average power density.
*This work was partly supported by JSPS KAKENHI Grant No. 22K03590.
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