Tuning the Ion Energy Distribution by Tailored Low-frequency Voltage Waveforms in CCPs

In a wide range of plasma-assisted surface modification technologies, the tuning of the flux energy distribution of the positive ion species (IFED) is of key importance in order to control the desired process. Low-pressure CCPs, characterized by a collisionless electrode sheath, utilizing multi-frequency Tailored Voltage Waveforms can be used to control the energy of the impacting ions separately from the ion flux. We present experimental IFED and DC bias voltage data, accompanied by detailed 1D and 2D PIC/MCC simulation results of argon discharges driven with tailored, pulsed, low-frequency (100 kHz) voltage waveforms in combination with a 27.1 MHz high-frequency power signal. Detailed insights into the operation, DC self-bias formation, sheath dynamics, electron, and ion acceleration processes are provided.